Tony S. Kaushal

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for refurbishing an electrostatic chuck with reduced plasma...
- Patent number 9,202,736
- Issue date Dec 1, 2015
- Applied Materials, Inc.
- Kadthala Ramaya Narendrnath
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of making an electrostatic chuck with reduced plasma penetra...
- Patent number 8,108,981
- Issue date Feb 7, 2012
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method and apparatus for providing an electrostatic chuck with redu...
- Patent number 7,848,076
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Kadthala Ramaya Narendranath
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Erosion-resistant components for plasma process chambers
- Patent number 7,670,688
- Issue date Mar 2, 2010
- Applied Materials, Inc.
- Tony S. Kaushal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for polishing metal and dielectric substrates
- Patent number 6,960,521
- Issue date Nov 1, 2005
- Applied Materials, Inc.
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Grant
Heated catalytic treatment of an effluent gas from a substrate fabr...
- Patent number 6,824,748
- Issue date Nov 30, 2004
- Applied Materials, Inc.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for polishing substrates comprising conductiv...
- Patent number 6,790,768
- Issue date Sep 14, 2004
- Applied Materials Inc.
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Grant
Elements having erosion resistance
- Patent number 6,789,498
- Issue date Sep 14, 2004
- Applied Materials, Inc.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical mechanical polishing endpoinat detection
- Patent number 6,709,314
- Issue date Mar 23, 2004
- Applied Materials Inc.
- Tony S. Kaushal
- B24 - GRINDING POLISHING
Information Patent Grant
Abatement of hazardous gases in effluent
- Patent number 6,689,252
- Issue date Feb 10, 2004
- Applied Materials, Inc.
- Shamouil Shamouilian
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Treatment of hazardous gases in effluent
- Patent number 6,673,323
- Issue date Jan 6, 2004
- Applied Materials, Inc.
- Ashish Bhatnagar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support pedestal
- Patent number 6,490,145
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Arnold V. Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement of fluorine gas from effluent
- Patent number 6,468,490
- Issue date Oct 22, 2002
- Applied Materials, Inc.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Erosion resistant gas energizer
- Patent number 6,391,146
- Issue date May 21, 2002
- Applied Materials, Inc.
- Ashish Bhatnagar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Porous ceramic liner for a plasma source
- Patent number 6,367,412
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Kartik Ramaswamy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for providing an electrostatic chuck with redu...
- Publication number 20090034147
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- Kadthala Ramaya Narendrnath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for refurbishing an electrostatic chuck with reduced plasma...
- Publication number 20090034149
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- Dmitry Lubomirsky
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of making an electrostatic chuck with reduced plasma penetra...
- Publication number 20090034148
- Publication date Feb 5, 2009
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Abatement of fluorine gas from effluent
- Publication number 20070022958
- Publication date Feb 1, 2007
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for polishing metal and dielectric substrates
- Publication number 20050032381
- Publication date Feb 10, 2005
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Application
Erosion-resistant components for plasma process chambers
- Publication number 20040033385
- Publication date Feb 19, 2004
- Tony S. Kaushal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Elements having erosion resistance
- Publication number 20030159657
- Publication date Aug 28, 2003
- APPLIED MATERIALS, INC.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical mechanical polishing endpoinat detection
- Publication number 20030087586
- Publication date May 8, 2003
- APPLIED MATERIALS, INC.
- Tony S. Kaushal
- B24 - GRINDING POLISHING
Information Patent Application
Sensor for in-situ pad wear during CMP
- Publication number 20030060127
- Publication date Mar 27, 2003
- Tony S. Kaushal
- B24 - GRINDING POLISHING
Information Patent Application
Corrosion resistant coating for semiconductor processing chamber
- Publication number 20030029563
- Publication date Feb 13, 2003
- APPLIED MATERIALS, INC.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for polishing metal and dielectric substrates
- Publication number 20030029841
- Publication date Feb 13, 2003
- APPLIED MATERIALS, INC.
- Yongsik Moon
- B24 - GRINDING POLISHING
Information Patent Application
Abatement of fluorine gas from effluent
- Publication number 20020192129
- Publication date Dec 19, 2002
- APPLIED MATERIALS, INC.
- Shamouil Shamouilian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heated catalytic treatment of an effluent gas from a substrate fabr...
- Publication number 20020182131
- Publication date Dec 5, 2002
- APPLIED MATERIALS, INC.
- Tony S. Kaushal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tony S. Kaushal

Person

Patents Grantslast 30 patents

Method for refurbishing an electrostatic chuck with reduced plasma...

Method of making an electrostatic chuck with reduced plasma penetra...

Method and apparatus for providing an electrostatic chuck with redu...

Erosion-resistant components for plasma process chambers

Method and apparatus for polishing metal and dielectric substrates

Heated catalytic treatment of an effluent gas from a substrate fabr...

Methods and apparatus for polishing substrates comprising conductiv...

Elements having erosion resistance

Chemical mechanical polishing endpoinat detection

Abatement of hazardous gases in effluent

Treatment of hazardous gases in effluent

Substrate support pedestal

Abatement of fluorine gas from effluent

Erosion resistant gas energizer

Porous ceramic liner for a plasma source

Patents Applicationslast 30 patents

Method and apparatus for providing an electrostatic chuck with redu...

Method for refurbishing an electrostatic chuck with reduced plasma...

Method of making an electrostatic chuck with reduced plasma penetra...

Abatement of fluorine gas from effluent

Method and apparatus for polishing metal and dielectric substrates

Erosion-resistant components for plasma process chambers

Elements having erosion resistance

Chemical mechanical polishing endpoinat detection

Sensor for in-situ pad wear during CMP

Corrosion resistant coating for semiconductor processing chamber

Method and apparatus for polishing metal and dielectric substrates

Abatement of fluorine gas from effluent

Heated catalytic treatment of an effluent gas from a substrate fabr...