Tooru ARAMAKI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,842,885
- Issue date Dec 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,811,231
- Issue date Oct 20, 2020
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,804,080
- Issue date Oct 13, 2020
- HITACHI HIGH-TECH CORPORATION
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,217,611
- Issue date Feb 26, 2019
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,037,909
- Issue date Jul 31, 2018
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample processing apparatus, sample processing system, and method f...
- Patent number 9,390,941
- Issue date Jul 12, 2016
- Hitachi High-Technologies Corporation
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vacuum processing apparatus and vacuum processing method of sample
- Patent number 7,947,189
- Issue date May 24, 2011
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 7,303,998
- Issue date Dec 4, 2007
- Hitachi High-Technologies Corporation
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200411291
- Publication date Dec 31, 2020
- HITACHI HIGH-TECH CORPORATION
- Tooru ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190198297
- Publication date Jun 27, 2019
- Hitachi High-Technologies Corporation
- Tooru ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190122864
- Publication date Apr 25, 2019
- Hitachi High-Technologies Corporation
- Tooru ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20190115193
- Publication date Apr 18, 2019
- Hitachi High-Technologies Corporation
- Naoki YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20170011890
- Publication date Jan 12, 2017
- Hitachi High-Technologies Corporation
- Tooru ARAMAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160351404
- Publication date Dec 1, 2016
- Hitachi High-Technologies Corporation
- Tooru ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160079107
- Publication date Mar 17, 2016
- Hitachi High-Technologies Corporation
- Tooru ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20140011365
- Publication date Jan 9, 2014
- Hitachi High-Technologies Corporation
- Naoki YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...
- Publication number 20120228261
- Publication date Sep 13, 2012
- Seiichi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100193130
- Publication date Aug 5, 2010
- Masatoshi KAWAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100163186
- Publication date Jul 1, 2010
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA TREATMENT
- Publication number 20090114152
- Publication date May 7, 2009
- Tooru ARAMAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus And Method Capable of Adjusting Tempera...
- Publication number 20090078563
- Publication date Mar 26, 2009
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method Capable Of Adjusting Tempera...
- Publication number 20090065145
- Publication date Mar 12, 2009
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum prcessing apparatus and vacuum processing method of sample
- Publication number 20090000741
- Publication date Jan 1, 2009
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus
- Publication number 20080236751
- Publication date Oct 2, 2008
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080121344
- Publication date May 29, 2008
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum Processing Apparatus And Vacuum Processing Method Of Sample
- Publication number 20070170149
- Publication date Jul 26, 2007
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck, wafer processing apparatus and plasma processi...
- Publication number 20060291132
- Publication date Dec 28, 2006
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method capable of adjusting tempera...
- Publication number 20060283549
- Publication date Dec 21, 2006
- Tooru Aramaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and vacuum processing method of sample
- Publication number 20060237391
- Publication date Oct 26, 2006
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method
- Publication number 20050242060
- Publication date Nov 3, 2005
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20050051098
- Publication date Mar 10, 2005
- Tooru Aramaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tooru ARAMAKI

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Sample processing apparatus, sample processing system, and method f...

Vacuum processing apparatus and vacuum processing method of sample

Plasma processing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

SAMPLE PROCESSING DEVICE, SAMPLE PROCESSING SYSTEM, AND METHOD FOR...

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus

APPARATUS FOR PLASMA TREATMENT

Plasma Processing Apparatus And Method Capable of Adjusting Tempera...

Plasma Processing Apparatus And Method Capable Of Adjusting Tempera...

Vacuum prcessing apparatus and vacuum processing method of sample

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS

Vacuum Processing Apparatus And Vacuum Processing Method Of Sample

Electrostatic chuck, wafer processing apparatus and plasma processi...

Plasma processing apparatus and method capable of adjusting tempera...

Vacuum processing apparatus and vacuum processing method of sample

Plasma processing method

Plasma processing apparatus