Tooru Kimura

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for film formation, resist underlayer film and forming...
- Patent number 9,581,905
- Issue date Feb 28, 2017
- JSR Corporation
- Shin-ya Nakafuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming resist underlayer film, and pattern-forming...
- Patent number 9,268,229
- Issue date Feb 23, 2016
- JSR Corporation
- Hiromitsu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming resist underlayer film, and pattern-forming...
- Patent number 9,250,526
- Issue date Feb 2, 2016
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 9,140,984
- Issue date Sep 22, 2015
- JSR Corporation
- Yuji Yada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming resist underlayer film and pattern-forming...
- Patent number 9,116,427
- Issue date Aug 25, 2015
- JSR Corporation
- Shunsuke Kurita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative radiation-sensitive resin composition
- Patent number 7,482,111
- Issue date Jan 27, 2009
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin film and cured film made therefrom
- Patent number 7,214,471
- Issue date May 8, 2007
- JSR Corporation
- Shin-ichiro Iwanaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,141,355
- Issue date Nov 28, 2006
- JSR Corporation
- Shin-ichiro Iwanaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a heterostructure transistor having a germ...
- Patent number 5,047,365
- Issue date Sep 10, 1991
- NEC Corporation
- Masafumi Kawanaka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING...
- Publication number 20160085152
- Publication date Mar 24, 2016
- JSR Corporation
- Shin-ya NAKAFUJI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING...
- Publication number 20130256264
- Publication date Oct 3, 2013
- JSR Corporation
- Hiromitsu TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING...
- Publication number 20130233825
- Publication date Sep 12, 2013
- JSR Corporation
- Shunsuke KURITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING...
- Publication number 20130233826
- Publication date Sep 12, 2013
- JSR Corporation
- Tomoaki SEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20130108965
- Publication date May 2, 2013
- JSR CORPORATION
- Masayuki MIYAKE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20120282550
- Publication date Nov 8, 2012
- JSR Corportion
- Yuji YADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Negative radiation-sensitive resin composition
- Publication number 20070190450
- Publication date Aug 16, 2007
- JSR Corporation
- Kouji Nishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin film and cured film made therefrom
- Publication number 20060210912
- Publication date Sep 21, 2006
- JSR Corporation
- Shin-ichiro Iwanaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20040142280
- Publication date Jul 22, 2004
- Shin-ichiro Iwanaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tooru Kimura

Person

Patents Grantslast 30 patents

Composition for film formation, resist underlayer film and forming...

Composition for forming resist underlayer film, and pattern-forming...

Composition for forming resist underlayer film, and pattern-forming...

Radiation-sensitive composition

Composition for forming resist underlayer film and pattern-forming...

Negative radiation-sensitive resin composition

Photosensitive resin film and cured film made therefrom

Radiation-sensitive resin composition

Method for manufacturing a heterostructure transistor having a germ...

Patents Applicationslast 30 patents

COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND PATTERN-FORMING...

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION

Negative radiation-sensitive resin composition

Photosensitive resin film and cured film made therefrom

Radiation-sensitive resin composition