Tooru KOMATSU

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Yokosuka, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing sputtering target and sputtering target
- Patent number 11,220,740
- Issue date Jan 11, 2022
- Kabushiki Kaisha Toshiba
- Tooru Komatsu
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of manufacturing sputtering target and sputtering target
- Patent number 11,198,933
- Issue date Dec 14, 2021
- Kabushiki Kaisha Toshiba
- Tooru Komatsu
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of manufacturing sputtering target and sputtering target
- Patent number 10,533,248
- Issue date Jan 14, 2020
- Kabushiki Kaisha Toshiba
- Tooru Komatsu
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
- Publication number 20200115790
- Publication date Apr 16, 2020
- Kabushiki Kaisha Toshiba
- Tooru KOMATSU
- B22 - CASTING POWDER METALLURGY
Information Patent Application
METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
- Publication number 20200115791
- Publication date Apr 16, 2020
- Kabushiki Kaisha Toshiba
- Tooru KOMATSU
- B22 - CASTING POWDER METALLURGY
Information Patent Application
METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
- Publication number 20170009336
- Publication date Jan 12, 2017
- Kabushiki Kaisha Toshiba
- Tooru KOMATSU
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...