Toranosuke Ashizawa

Person

Hitachinaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 8,616,936
- Issue date Dec 31, 2013
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 8,162,725
- Issue date Apr 24, 2012
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 8,137,159
- Issue date Mar 20, 2012
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry and polishing method
- Patent number 8,075,800
- Issue date Dec 13, 2011
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP abrasive, method for polishing substrate and method for manufac...
- Patent number 8,002,860
- Issue date Aug 23, 2011
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 7,963,825
- Issue date Jun 21, 2011
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for polishing aluminum film and polishing method f...
- Patent number 7,887,609
- Issue date Feb 15, 2011
- Hitachi Chemical Co., Ltd.
- Hiroshi Ono
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 7,871,308
- Issue date Jan 18, 2011
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 7,867,303
- Issue date Jan 11, 2011
- Hitachi Chemical Co., Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 7,708,788
- Issue date May 4, 2010
- Hitachi Chemical Co, Ltd.
- Masato Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abrasive compound for CMP, method for polishing substrate and metho...
- Patent number 7,410,409
- Issue date Aug 12, 2008
- Hitachi Chemical Co., Ltd.
- Naoyuki Koyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Patent number 7,163,644
- Issue date Jan 16, 2007
- Hitachi Chemical Company, Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, method of polishing target member and process for produci...
- Patent number 7,115,021
- Issue date Oct 3, 2006
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 6,863,700
- Issue date Mar 8, 2005
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Patent number 6,783,434
- Issue date Aug 31, 2004
- Hitachi Chemical Company, Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Grant
Method for producing cerium oxide, cerium oxide abrasive, method fo...
- Patent number 6,615,499
- Issue date Sep 9, 2003
- Hitachi Chemical Co., Ltd.
- Jun Matsuzawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
FLUORESCENT PATTERN, PROCESS FOR PREPARING THE SAME, ORGANIC ALKALI...
- Patent number 6,358,663
- Issue date Mar 19, 2002
- Hitachi Chemical Co., Ltd.
- Naoki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abrasive, method of polishing wafer, and method of producing semico...
- Patent number 6,343,976
- Issue date Feb 5, 2002
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorescent pattern, process for preparing the same, organic alkali...
- Patent number 6,232,024
- Issue date May 15, 2001
- Hitachi Chemical Co., Ltd.
- Naoki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cerium oxide abrasive and method of polishing substrates
- Patent number 6,221,118
- Issue date Apr 24, 2001
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Process for preparing phosphor pattern, phosphor pattern prepared t...
- Patent number 6,194,826
- Issue date Feb 27, 2001
- Hitachi Chemical Co., Ltd.
- Kazuya Satou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide superconductor Bi--Sr--Ca--Mg--Ba--Cu--O
- Patent number 5,238,911
- Issue date Aug 24, 1993
- Hitachi Chemical Company Ltd.
- Hidegi Kuwajima
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Bi-Pb-Sr-Mg-Ba-Ca-Cu-O oxide superconductors and production thereof
- Patent number 5,194,421
- Issue date Mar 16, 1993
- Hitachi Chemical Company
- Shuichiro Shimoda
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Superconducting thick film circuit board, production thereof, thick...
- Patent number 5,147,851
- Issue date Sep 15, 1992
- Hitachi Chemical Company Ltd.
- Shozo Yamana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing zirconium oxide sintered body
- Patent number 4,542,110
- Issue date Sep 17, 1985
- Hitachi Chemical Company, Ltd.
- Takao Nakada
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING...
- Publication number 20160359078
- Publication date Dec 8, 2016
- Hitachi Chemical Company, Ltd.
- Tetsuya SATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR PRODUCIN...
- Publication number 20150017754
- Publication date Jan 15, 2015
- HITACHI CHEMICAL COMPANY, LTD.
- Tetsuya Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...
- Publication number 20120227331
- Publication date Sep 13, 2012
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Abrasive, Method of Polishing Target Member and Process for Produci...
- Publication number 20110312251
- Publication date Dec 22, 2011
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP SLURRY FOR SILICON FILM
- Publication number 20100001229
- Publication date Jan 7, 2010
- HITACHI CHEMICAL CO., LTD.
- Hiroshi Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFAC...
- Publication number 20090253355
- Publication date Oct 8, 2009
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...
- Publication number 20080271383
- Publication date Nov 6, 2008
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING METHOD OF SEMICONDUCTOR SUBSTRATE
- Publication number 20080200032
- Publication date Aug 21, 2008
- HITACHI CHEMICAL CO., Ltd.
- Toranosuke ASHIZAWA
- B24 - GRINDING POLISHING
Information Patent Application
Abrasive, method of polishing target member and process for produci...
- Publication number 20070266642
- Publication date Nov 22, 2007
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DE...
- Publication number 20070270085
- Publication date Nov 22, 2007
- Ryo Ota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for silicon oxide, additive liquid and polishing m...
- Publication number 20070175104
- Publication date Aug 2, 2007
- HITACHI CHEMICAL CO., Ltd.
- Masaya Nishiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP abrasive, method for polishing substrate and method for manufac...
- Publication number 20070169421
- Publication date Jul 26, 2007
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for polishing aluminum film and polishing method f...
- Publication number 20070141957
- Publication date Jun 21, 2007
- HITACHI CHEMICAL CO., Ltd.
- Hiroshi Ono
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hazardous substance decomposer and process for producing the same
- Publication number 20060289826
- Publication date Dec 28, 2006
- Naoyuki Koyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Abrasive, method of polishing target member and process for produci...
- Publication number 20060248804
- Publication date Nov 9, 2006
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20060197054
- Publication date Sep 7, 2006
- Hitachi Chemical Co., Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20060186372
- Publication date Aug 24, 2006
- Hitachi Chemical Co., Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CERIUM OXIDE ABRASIVE AND METHOD OF POLISHING SUBSTRATES
- Publication number 20060180787
- Publication date Aug 17, 2006
- HITACHI CHEMICAL CO., Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CERIUM OXIDE ABRASIVE AND METHOD OF POLISHING SUBSTRATES
- Publication number 20060118524
- Publication date Jun 8, 2006
- HITACHI CHEMICAL CO., Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20050269295
- Publication date Dec 8, 2005
- Hitachi Chemical Company Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20050118820
- Publication date Jun 2, 2005
- Hitachi Chemical Company Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
Cerium oxide abrasive and method of polishing substrates
- Publication number 20050085168
- Publication date Apr 21, 2005
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20040147206
- Publication date Jul 29, 2004
- Hitachi Chemical Company Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
Abrasive, method of polishing target member and process for produci...
- Publication number 20020090895
- Publication date Jul 11, 2002
- Masato Yoshida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cerium Oxide abrasive and method of polishing substrates
- Publication number 20020069593
- Publication date Jun 13, 2002
- Hitachi Chemical Company, Ltd.
- Masato Yoshida
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Fluorescent pattern, process for preparing the same, organic alkali...
- Publication number 20020037478
- Publication date Mar 28, 2002
- Naoki Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fluorescent pattern, process for preparing the same, organic alkali...
- Publication number 20010002302
- Publication date May 31, 2001
- Naoki Kimura
- H01 - BASIC ELECTRIC ELEMENTS

Toranosuke Ashizawa

Person

Patents Grantslast 30 patents

Abrasive, method of polishing target member and process for produci...

Abrasive, method of polishing target member and process for produci...

Abrasive, method of polishing target member and process for produci...

Polishing slurry and polishing method

CMP abrasive, method for polishing substrate and method for manufac...

Abrasive, method of polishing target member and process for produci...

Polishing slurry for polishing aluminum film and polishing method f...

Abrasive, method of polishing target member and process for produci...

Cerium oxide abrasive and method of polishing substrates

Cerium oxide abrasive and method of polishing substrates

Abrasive compound for CMP, method for polishing substrate and metho...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Abrasive, method of polishing target member and process for produci...

Cerium oxide abrasive and method of polishing substrates

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Method for producing cerium oxide, cerium oxide abrasive, method fo...

FLUORESCENT PATTERN, PROCESS FOR PREPARING THE SAME, ORGANIC ALKALI...

Abrasive, method of polishing wafer, and method of producing semico...

Fluorescent pattern, process for preparing the same, organic alkali...

Cerium oxide abrasive and method of polishing substrates

Process for preparing phosphor pattern, phosphor pattern prepared t...

Oxide superconductor Bi--Sr--Ca--Mg--Ba--Cu--O

Bi-Pb-Sr-Mg-Ba-Ca-Cu-O oxide superconductors and production thereof

Superconducting thick film circuit board, production thereof, thick...

Process for producing zirconium oxide sintered body

Patents Applicationslast 30 patents

COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING...

COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR PRODUCIN...

ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...

Abrasive, Method of Polishing Target Member and Process for Produci...

CMP SLURRY FOR SILICON FILM

CMP ABRASIVE, METHOD FOR POLISHING SUBSTRATE AND METHOD FOR MANUFAC...

ABRASIVE, METHOD OF POLISHING TARGET MEMBER AND PROCESS FOR PRODUCI...

POLISHING METHOD OF SEMICONDUCTOR SUBSTRATE

Abrasive, method of polishing target member and process for produci...

CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DE...

Polishing slurry for silicon oxide, additive liquid and polishing m...

CMP abrasive, method for polishing substrate and method for manufac...

Polishing slurry for polishing aluminum film and polishing method f...

Hazardous substance decomposer and process for producing the same

Abrasive, method of polishing target member and process for produci...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CERIUM OXIDE ABRASIVE AND METHOD OF POLISHING SUBSTRATES

CERIUM OXIDE ABRASIVE AND METHOD OF POLISHING SUBSTRATES

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Cerium oxide abrasive and method of polishing substrates

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Abrasive, method of polishing target member and process for produci...

Cerium Oxide abrasive and method of polishing substrates

Fluorescent pattern, process for preparing the same, organic alkali...

Fluorescent pattern, process for preparing the same, organic alkali...