Toru HISAMATSU

Person

Hillsboro, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for processing a substrate
- Patent number 12,074,009
- Issue date Aug 27, 2024
- Tokyo Electron Limited
- Yuki Iijima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for processing a substrate
- Patent number 12,020,904
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Yuki Iijima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,545,355
- Issue date Jan 3, 2023
- Tokyo Electron Limited
- Kae Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and plasma processing apparatus
- Patent number 11,469,111
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing a substrate
- Patent number 11,201,062
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Yuki Iijima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230122980
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Kae KUMAGAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230018151
- Publication date Jan 19, 2023
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220375724
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Manabu OIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220093406
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Yuki IIJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210143004
- Publication date May 13, 2021
- TOKYO ELECTRON LIMITED
- Kae KUMAGAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210098263
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20200411325
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Yuki IIJIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toru HISAMATSU

Person

Patents Grantslast 30 patents

Apparatus for processing a substrate

Apparatus for processing a substrate

Substrate processing method and substrate processing apparatus

Substrate processing method and plasma processing apparatus

Method and apparatus for processing a substrate

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE