Toru Otsubo

Person

Fujisawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,902,683
- Issue date Jun 7, 2005
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus with measuring unit and method
- Patent number 6,797,529
- Issue date Sep 28, 2004
- Hitachi, Ltd.
- Toru Otsubo
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for monitoring thickness of deposited layer in reactor an...
- Patent number 6,750,977
- Issue date Jun 15, 2004
- Hitachi, Ltd.
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measuring apparatus and film formation method
- Patent number 6,537,832
- Issue date Mar 25, 2003
- Hitach, Ltd.
- Toru Otsubo
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,422,172
- Issue date Jul 23, 2002
- Hitachi, Ltd.
- Jyunichi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system and plasma processing method
- Patent number 6,245,190
- Issue date Jun 12, 2001
- Hitachi, Ltd.
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,197,151
- Issue date Mar 6, 2001
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,158,383
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 6,129,806
- Issue date Oct 10, 2000
- Hitachi, Ltd.
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus using plasma produced by mic...
- Patent number 5,762,814
- Issue date Jun 9, 1998
- Hitachi, Ltd.
- Kazuhiro Ohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 5,759,424
- Issue date Jun 2, 1998
- Hitachi, Ltd.
- Mitsuko Imatake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for removing foreign particles
- Patent number 5,531,862
- Issue date Jul 2, 1996
- Hitachi, Ltd.
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus using plasma produced by microwaves
- Patent number 5,304,277
- Issue date Apr 19, 1994
- Hitachi, Ltd.
- Kazuhiro Ohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating film forming method for semiconductor device interconnec...
- Patent number 5,275,977
- Issue date Jan 4, 1994
- Hitachi, Ltd.
- Toru Otsubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and method for plasma processing
- Patent number 5,134,965
- Issue date Aug 4, 1992
- Hitachi, Ltd.
- Mitsuo Tokuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for plasma processing
- Patent number 4,985,109
- Issue date Jan 15, 1991
- Hitachi, Ltd.
- Toru Otsubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring the depth of fine engraved patterns
- Patent number RE33424
- Issue date Nov 6, 1990
- Hitachi, Ltd.
- Minori Noguchi
- 356 - Optics: measuring and testing
Information Patent Grant
Measuring apparatus for etching pits
- Patent number 4,840,487
- Issue date Jun 20, 1989
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing method and apparatus for carrying out the same
- Patent number 4,808,258
- Issue date Feb 28, 1989
- Hitachi, Ltd.
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 4,776,918
- Issue date Oct 11, 1988
- Hitachi, Ltd.
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for measuring difference in shallow level
- Patent number 4,744,660
- Issue date May 17, 1988
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
Method of controlling dry etching by applying an AC voltage to the...
- Patent number 4,622,094
- Issue date Nov 11, 1986
- Hitachi, Ltd.
- Toru Otsubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for measuring the depth of fine engraved patterns
- Patent number 4,615,620
- Issue date Oct 7, 1986
- Hitachi, Ltd.
- Minori Noguchi
- G01 - MEASURING TESTING
Information Patent Grant
Dry-etching apparatus
- Patent number 4,487,678
- Issue date Dec 11, 1984
- Hitachi, Ltd.
- Minori Noguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and apparatus
- Patent number 4,479,848
- Issue date Oct 30, 1984
- Hitachi, Ltd.
- Toru Otsubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projecting apparatus
- Patent number 4,420,233
- Issue date Dec 13, 1983
- Hitachi, Ltd.
- Mineo Nomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20060144518
- Publication date Jul 6, 2006
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050082006
- Publication date Apr 21, 2005
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040178180
- Publication date Sep 16, 2004
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and processing method
- Publication number 20040037971
- Publication date Feb 26, 2004
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Measuring apparatus and film formation method
- Publication number 20030176000
- Publication date Sep 18, 2003
- Toru Otsubo
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20030010453
- Publication date Jan 16, 2003
- Jyunichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measuring apparatus and film formation method
- Publication number 20020164829
- Publication date Nov 7, 2002
- Toru Otsubo
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20020069971
- Publication date Jun 13, 2002
- Tetsunori Kaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for monitoring thickness of deposited layer in reactor an...
- Publication number 20010043984
- Publication date Nov 22, 2001
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and processing method
- Publication number 20010037770
- Publication date Nov 8, 2001
- Toru Otsubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toru Otsubo

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Processing apparatus with measuring unit and method

Apparatus for monitoring thickness of deposited layer in reactor an...

Measuring apparatus and film formation method

Plasma processing apparatus and plasma processing method

Plasma processing system and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing method and apparatus

Plasma processing apparatus and plasma processing method

Plasma processing method and apparatus using plasma produced by mic...

Plasma processing apparatus and processing method

Method of and apparatus for removing foreign particles

Plasma processing apparatus using plasma produced by microwaves

Insulating film forming method for semiconductor device interconnec...

Processing apparatus and method for plasma processing

Apparatus for plasma processing

Apparatus and method for measuring the depth of fine engraved patterns

Measuring apparatus for etching pits

Plasma processing method and apparatus for carrying out the same

Plasma processing apparatus

Apparatus for measuring difference in shallow level

Method of controlling dry etching by applying an AC voltage to the...

Apparatus for measuring the depth of fine engraved patterns

Dry-etching apparatus

Etching method and apparatus

Projecting apparatus

Patents Applicationslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and processing method

Measuring apparatus and film formation method

Plasma processing apparatus and plasma processing method

Measuring apparatus and film formation method

Plasma processing apparatus and plasma processing method

Apparatus for monitoring thickness of deposited layer in reactor an...

Plasma processing apparatus and processing method