Toru Tsuchihashi

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,042,094
- Issue date Jun 22, 2021
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 10,962,884
- Issue date Mar 30, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, resist pattern, method for manufacturing el...
- Patent number 10,890,847
- Issue date Jan 12, 2021
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method and electronic device manufacturing method
- Patent number 10,788,754
- Issue date Sep 29, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,761,426
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,663,864
- Issue date May 26, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing liquid, pattern forming method, and electronic device manuf...
- Patent number 10,599,038
- Issue date Mar 24, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer, pattern forming method, and electronic device manufactur...
- Patent number 10,562,991
- Issue date Feb 18, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method for manufacturing electronic device
- Patent number 10,394,127
- Issue date Aug 27, 2019
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 9,709,892
- Issue date Jul 18, 2017
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,632,410
- Issue date Apr 25, 2017
- FUJIFILM Corporation
- Shuhei Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,563,121
- Issue date Feb 7, 2017
- FUJIFILM Corporation
- Takeshi Inasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and resist composition
- Patent number 9,551,935
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for developing resist, method for forming a resist pattern,...
- Patent number 9,417,530
- Issue date Aug 16, 2016
- FUJIFILM Corporation
- Ikuo Takano
- G11 - INFORMATION STORAGE
Information Patent Grant
Photosensitive composition, pattern-forming method using the compos...
- Patent number 9,217,919
- Issue date Dec 22, 2015
- FUJIFILM Corporation
- Hidenori Takahashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern forming method, resist pattern, crosslinkable negati...
- Patent number 8,968,988
- Issue date Mar 3, 2015
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern forming method, resist pattern, positive resist comp...
- Patent number 8,906,600
- Issue date Dec 9, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,900,791
- Issue date Dec 2, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist pattern forming method, resist pattern, crosslinkable negati...
- Patent number 8,889,339
- Issue date Nov 18, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,852,845
- Issue date Oct 7, 2014
- FUJIFILM Corporation
- Hidenori Takahashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Negative resist pattern forming method, developer and negative chem...
- Patent number 8,637,222
- Issue date Jan 28, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organic solvent development or multiple development pattern-forming...
- Patent number 8,546,063
- Issue date Oct 1, 2013
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,349,535
- Issue date Jan 8, 2013
- FUJIFILM Corporation
- Kana Fujii
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 8,084,187
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,923,196
- Issue date Apr 12, 2011
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and pattern forming method using the same
- Patent number 7,625,690
- Issue date Dec 1, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RINSING LIQUID AND PATTERN FORMING METHOD
- Publication number 20230132693
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Satomi TAKAHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20220308449
- Publication date Sep 29, 2022
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20220179312
- Publication date Jun 9, 2022
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20210200097
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217503
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217499
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Shuji HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20180186907
- Publication date Jul 5, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180181003
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180180996
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND ACTIN...
- Publication number 20180120697
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Toru FUJIMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20180120705
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUF...
- Publication number 20180120708
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180101100
- Publication date Apr 12, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180017872
- Publication date Jan 18, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD
- Publication number 20170285482
- Publication date Oct 5, 2017
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20170075222
- Publication date Mar 16, 2017
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20160018732
- Publication date Jan 21, 2016
- FUJIFILM CORPORATION
- SHUHEI YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEVELOPING RESIST, METHOD FOR FORMING A RESIST PATTERN,...
- Publication number 20150008211
- Publication date Jan 8, 2015
- FUJIFILM CORPORATION
- Ikuo TAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20140342275
- Publication date Nov 20, 2014
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...
- Publication number 20140030640
- Publication date Jan 30, 2014
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTERN...
- Publication number 20140030656
- Publication date Jan 30, 2014
- FUJIFILM CORPORATION
- Toshihiro USA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...
- Publication number 20130052567
- Publication date Feb 28, 2013
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, POSITIVE RESIST COMP...
- Publication number 20130052568
- Publication date Feb 28, 2013
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKING NEGATIV...
- Publication number 20130045440
- Publication date Feb 21, 2013
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20130017377
- Publication date Jan 17, 2013
- FUJIFILM Corporation
- Shohei Kataoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20130011785
- Publication date Jan 10, 2013
- FUJIFILM Corporation
- Keita Kato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PATTERN FORMING METHOD AND RESIST COMPOSITION
- Publication number 20120321855
- Publication date Dec 20, 2012
- FUJIFILM Corporation
- Kaoru Iwato
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120094235
- Publication date Apr 19, 2012
- FUJIFILM Corporation
- Toru Tsuchihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120003585
- Publication date Jan 5, 2012
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING...
- Publication number 20110300485
- Publication date Dec 8, 2011
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toru Tsuchihashi

Person

Patents Grantslast 30 patents

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Pattern forming method, resist pattern, method for manufacturing el...

Pattern forming method and electronic device manufacturing method

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, method for manufacturing electronic device,...

Rinsing liquid, pattern forming method, and electronic device manuf...

Developer, pattern forming method, and electronic device manufactur...

Pattern forming method and method for manufacturing electronic device

Pattern forming method and resist composition

Actinic-ray- or radiation-sensitive resin composition and method of...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method and resist composition

Method for developing resist, method for forming a resist pattern,...

Photosensitive composition, pattern-forming method using the compos...

Resist pattern forming method, resist pattern, crosslinkable negati...

Resist pattern forming method, resist pattern, positive resist comp...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Resist pattern forming method, resist pattern, crosslinkable negati...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Negative resist pattern forming method, developer and negative chem...

Organic solvent development or multiple development pattern-forming...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern forming method using the same

Patents Applicationslast 30 patents

RINSING LIQUID AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

TREATMENT LIQUID AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTUR...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND ACTIN...

PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD

RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUF...

TREATMENT LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD FOR DEVELOPING RESIST, METHOD FOR FORMING A RESIST PATTERN,...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...

METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTERN...

RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...

RESIST PATTERN FORMING METHOD, RESIST PATTERN, POSITIVE RESIST COMP...

RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKING NEGATIV...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

PATTERN FORMING METHOD AND RESIST COMPOSITION

PATTERN FORMING METHOD AND RESIST COMPOSITION

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING...