Toshiaki Akutsu

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Abrasive, abrasive set, and method for polishing substrate
- Patent number 10,759,968
- Issue date Sep 1, 2020
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing agent, polishing agent set, and substrate polishing method
- Patent number 10,557,058
- Issue date Feb 11, 2020
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 10,557,059
- Issue date Feb 11, 2020
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 10,549,399
- Issue date Feb 4, 2020
- HITACHI CHEMCIAL COMPANY, LTD.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, abrasive set, and method for abrading substrate
- Patent number 10,196,542
- Issue date Feb 5, 2019
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing liquid for CMP, and polishing method
- Patent number 10,155,886
- Issue date Dec 18, 2018
- Hitachi Chemical Company, Ltd.
- Munehiro Oota
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Abrasive, abrasive set, and method for polishing substrate
- Patent number 10,030,172
- Issue date Jul 24, 2018
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 9,932,497
- Issue date Apr 3, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Abrasive, abrasive set, and method for abrading substrate
- Patent number 9,346,977
- Issue date May 24, 2016
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Slurry, polishing-solution set, polishing solution, substrate polis...
- Patent number 9,346,978
- Issue date May 24, 2016
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Cmp polishing slurry and method of polishing substrate
- Patent number 9,293,344
- Issue date Mar 22, 2016
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing agent, polishing agent set and method for polishing base
- Patent number 9,163,162
- Issue date Oct 20, 2015
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP polishing slurry and method of polishing substrate
- Patent number 8,900,335
- Issue date Dec 2, 2014
- Hitachi Chemical Company, Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE
- Publication number 20180320024
- Publication date Nov 8, 2018
- Hitachi Chemical Company, Ltd.
- Hisataka MINAMI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD
- Publication number 20180258319
- Publication date Sep 13, 2018
- Hitachi Chemical Company, Ltd.
- Toshiaki AKUTSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE
- Publication number 20160319159
- Publication date Nov 3, 2016
- Hitachi Chemical Company, Ltd.
- Hisataka MINAMI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING LIQUID FOR CMP, AND POLISHING METHOD
- Publication number 20160137881
- Publication date May 19, 2016
- Hitachi Chemical Company, Ltd.
- Munehiro OOTA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE
- Publication number 20160040041
- Publication date Feb 11, 2016
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT, POLISHING AGENT SET AND METHOD FOR POLISHING BASE
- Publication number 20150232704
- Publication date Aug 20, 2015
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150140904
- Publication date May 21, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150139885
- Publication date May 21, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150132208
- Publication date May 14, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE GRAINS, SLURRY, POLISHING SOLUTION, AND MANUFACTURING METH...
- Publication number 20150129796
- Publication date May 14, 2015
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...
- Publication number 20150098887
- Publication date Apr 9, 2015
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE
- Publication number 20150024596
- Publication date Jan 22, 2015
- Hitachi Chemical Company, Ltd.
- Hisataka Minami
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT, POLISHING AGENT SET, AND SUBSTRATE POLISHING METHOD
- Publication number 20150017806
- Publication date Jan 15, 2015
- Hitachi Chemical Company, Ltd.
- Toshiaki Akutsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...
- Publication number 20130059439
- Publication date Mar 7, 2013
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...
- Publication number 20120299158
- Publication date Nov 29, 2012
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING LIQUID, AND SEMICONDUCTOR SUBSTRATE M...
- Publication number 20120214307
- Publication date Aug 23, 2012
- Hitachi Chemical Company, Ltd.
- Shigeru Yoshikawa
- B24 - GRINDING POLISHING
Information Patent Application
CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE
- Publication number 20100210109
- Publication date Aug 19, 2010
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND...
- Publication number 20100015806
- Publication date Jan 21, 2010
- Masato Fukasawa
- B24 - GRINDING POLISHING
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080254717
- Publication date Oct 16, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Cmp Polishing Slurry and Method of Polishing Substrate
- Publication number 20080003925
- Publication date Jan 3, 2008
- HITACHI CHEMICAL CO., Ltd.
- Masato Fukasawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for silicon oxide, additive liquid and polishing m...
- Publication number 20070175104
- Publication date Aug 2, 2007
- HITACHI CHEMICAL CO., Ltd.
- Masaya Nishiyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Toshiaki Akutsu

Person

Patents Grantslast 30 patents

Abrasive, abrasive set, and method for polishing substrate

Polishing agent, polishing agent set, and substrate polishing method

Slurry, polishing-solution set, polishing solution, substrate polis...

Slurry, polishing-solution set, polishing solution, substrate polis...

Abrasive, abrasive set, and method for abrading substrate

Polishing liquid for CMP, and polishing method

Abrasive, abrasive set, and method for polishing substrate

Slurry, polishing-solution set, polishing solution, substrate polis...

Abrasive, abrasive set, and method for abrading substrate

Slurry, polishing-solution set, polishing solution, substrate polis...

Cmp polishing slurry and method of polishing substrate

Polishing agent, polishing agent set and method for polishing base

CMP polishing slurry and method of polishing substrate

Patents Applicationslast 30 patents

ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE

POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD

ABRASIVE, ABRASIVE SET, AND METHOD FOR POLISHING SUBSTRATE

POLISHING LIQUID FOR CMP, AND POLISHING METHOD

ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE

POLISHING AGENT, POLISHING AGENT SET AND METHOD FOR POLISHING BASE

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

ABRASIVE GRAINS, SLURRY, POLISHING SOLUTION, AND MANUFACTURING METH...

SLURRY, POLISHING-SOLUTION SET, POLISHING SOLUTION, SUBSTRATE POLIS...

ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE

POLISHING AGENT, POLISHING AGENT SET, AND SUBSTRATE POLISHING METHOD

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONI...

CHEMICAL-MECHANICAL POLISHING LIQUID, AND SEMICONDUCTOR SUBSTRATE M...

CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE

CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND...

Cmp Polishing Slurry and Method of Polishing Substrate

Cmp Polishing Slurry and Method of Polishing Substrate

Polishing slurry for silicon oxide, additive liquid and polishing m...