Toshiaki Fujimura

Person

Otsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Multilayered photopolymer element including sensitivity controlling...
- Patent number 6,333,134
- Issue date Dec 25, 2001
- Toyo Boseki Kabushiki Kaisha
- Yuji Taguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antistatic photosensitive multilayered structure and method for pro...
- Patent number 5,780,202
- Issue date Jul 14, 1998
- Toyo Boseki Kabushiki Kaisha
- Shigenori Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 5,204,223
- Issue date Apr 20, 1993
- Toyo Boseki Kabushiki Kaisha
- Yuji Taguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dot-etchable image-containing element useful in lithographic mask f...
- Patent number 4,699,859
- Issue date Oct 13, 1987
- Toyo Boseki Kabushiki Kaisha
- Toshiaki Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition
- Patent number 4,544,624
- Issue date Oct 1, 1985
- Toyo Boseki Kabnushiki Kaisha
- Masaru Nanpei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive polyamide resin composition useful for making relief...
- Patent number 4,188,221
- Issue date Feb 12, 1980
- Toyo Boseki Kabushiki Kaisha
- Masaru Nanpei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshiaki Fujimura

Person

Patents Grantslast 30 patents

Multilayered photopolymer element including sensitivity controlling...

Antistatic photosensitive multilayered structure and method for pro...

Photosensitive resin composition

Dot-etchable image-containing element useful in lithographic mask f...

Photosensitive resin composition

Photosensitive polyamide resin composition useful for making relief...