Toshiaki Fukuhara

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist material and pattern formation method
- Patent number 7,588,876
- Issue date Sep 15, 2009
- Panasonic Corporation
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonamide compound, polymer compound, resist material and pattern...
- Patent number 7,413,843
- Issue date Aug 19, 2008
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist material and pattern formation method
- Patent number 7,378,216
- Issue date May 27, 2008
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, resist material and pattern formation method
- Patent number 7,169,530
- Issue date Jan 30, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonamide compound, polymer compound, resist material and pattern...
- Patent number 7,166,418
- Issue date Jan 23, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, resist material and pattern formation method
- Patent number 7,060,775
- Issue date Jun 13, 2006
- Matsushita Electronic Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Sulfonamide compound, polymer compound, resist material and pattern...
- Publication number 20070099117
- Publication date May 3, 2007
- Matsushita Electric Industrial Co., Ltd.
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist material and pattern formation method
- Publication number 20050277057
- Publication date Dec 15, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and pattern formation method
- Publication number 20050266337
- Publication date Dec 1, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and pattern formation method
- Publication number 20050266338
- Publication date Dec 1, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer compound, resist material and pattern formation method
- Publication number 20050186501
- Publication date Aug 25, 2005
- Shinji Kishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer compound, resist material and pattern formation method
- Publication number 20050074693
- Publication date Apr 7, 2005
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Sulfonamide compound, polymer compound, resist material and pattern...
- Publication number 20050058935
- Publication date Mar 17, 2005
- Shinji Kishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Toshiaki Fukuhara

Person

Patents Grantslast 30 patents

Resist material and pattern formation method

Sulfonamide compound, polymer compound, resist material and pattern...

Resist material and pattern formation method

Polymer compound, resist material and pattern formation method

Sulfonamide compound, polymer compound, resist material and pattern...

Polymer compound, resist material and pattern formation method

Patents Applicationslast 30 patents

Sulfonamide compound, polymer compound, resist material and pattern...

Resist material and pattern formation method

Resist material and pattern formation method

Resist material and pattern formation method

Polymer compound, resist material and pattern formation method

Polymer compound, resist material and pattern formation method

Sulfonamide compound, polymer compound, resist material and pattern...