Toshiaki Hato

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming pattern
- Patent number 9,459,535
- Issue date Oct 4, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 9,244,349
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, compound, polymeric compound and method of form...
- Patent number 9,244,347
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,188,863
- Issue date Nov 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 9,164,380
- Issue date Oct 20, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern and compound
- Patent number 9,063,416
- Issue date Jun 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt and photo-acid generator
- Patent number 9,045,398
- Issue date Jun 2, 2015
- San-Apro Limited
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,785,106
- Issue date Jul 22, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 8,354,218
- Issue date Jan 15, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Isao Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
SULFONIUM SALT AND PHOTO-ACID GENERATOR
- Publication number 20140357896
- Publication date Dec 4, 2014
- SAN-APRO LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...
- Publication number 20140356787
- Publication date Dec 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130344435
- Publication date Dec 26, 2013
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130224658
- Publication date Aug 29, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20130209941
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMITED
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130189619
- Publication date Jul 25, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
- Publication number 20130157197
- Publication date Jun 20, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110039207
- Publication date Feb 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Isao HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100310985
- Publication date Dec 9, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi MORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshiaki Hato

Person

Patents Grantslast 30 patents

Method of forming pattern

Positive resist composition and method of forming resist pattern

Resist composition, compound, polymeric compound and method of form...

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern and compound

Sulfonium salt and photo-acid generator

Resist composition and method of forming resist pattern

Resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

SULFONIUM SALT AND PHOTO-ACID GENERATOR

RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORM...

RESIST COMPPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN