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Toshiaki Hongo

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  • Nirasaki-shi, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 8,092,642
    • Issue date Jan 10, 2012
    • Tokyo Electron Limited
    • Toshiaki Hongo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method for forming a silicon nitride film on a si...
    • Patent number 7,629,033
    • Issue date Dec 8, 2009
    • Tokyo Electron Limited
    • Toshiaki Hongo
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,729,261
    • Issue date May 4, 2004
    • Tokyo Electron Limited
    • Toshiaki Hongo
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 6,656,322
    • Issue date Dec 2, 2003
    • Tokyo Electron Limited
    • Toshiaki Hongo
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plating apparatus
    • Patent number 6,428,661
    • Issue date Aug 6, 2002
    • Tokyo Electron Ltd.
    • Toshiaki Hongo
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Plasma processing apparatus with a dielectric plate having a thickn...
    • Patent number 6,372,084
    • Issue date Apr 16, 2002
    • Tokyo Electron Limited
    • Toshiaki Hongo
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents