Toshiaki Hongoh

Person

Nakakoma-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for forming insulating layer
- Patent number 7,569,497
- Issue date Aug 4, 2009
- Tokyo Electron Limited
- Toshiaki Hongoh
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,018,506
- Issue date Mar 28, 2006
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process apparatus
- Patent number RE39020
- Issue date Mar 21, 2006
- Tokyo Electron, Ltd.
- Kiichi Hama
- 156 - Adhesive bonding and miscellaneous chemical manufacture
Information Patent Grant
Plasma processing apparatus
- Patent number 6,797,111
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma processing apparatus for controlling a temperature...
- Patent number 6,736,930
- Issue date May 18, 2004
- Tokyo Electron Limited
- Toshiaki Hongoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,675,737
- Issue date Jan 13, 2004
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 6,470,824
- Issue date Oct 29, 2002
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing method and semiconductor manufacturing...
- Patent number 6,399,520
- Issue date Jun 4, 2002
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus having a vacuum pump located...
- Patent number 6,358,324
- Issue date Mar 19, 2002
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flat antenna having rounded slot openings and plasma processing app...
- Patent number 6,343,565
- Issue date Feb 5, 2002
- Tokyo Electron Limited
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Flat antenna having openings provided with conductive materials acc...
- Patent number 6,325,018
- Issue date Dec 4, 2001
- Tokyo Electron Limited
- Toshiaki Hongoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus
- Patent number 5,792,261
- Issue date Aug 11, 1998
- Tokyo Electron Limited
- Kiichi Hama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 5,716,451
- Issue date Feb 10, 1998
- Tokyo Electron Limited
- Kiichi Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus
- Patent number 5,525,159
- Issue date Jun 11, 1996
- Tokyo Electron Limited
- Kiichi Hama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck device
- Patent number 5,179,498
- Issue date Jan 12, 1993
- Tokyo Electron Limited
- Toshiaki Hongoh
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for forming insulating layer
- Publication number 20050148167
- Publication date Jul 7, 2005
- TOKYO ELECTRON LIMITED
- Toshiaki Hongoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing apparatus
- Publication number 20040011465
- Publication date Jan 22, 2004
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040011466
- Publication date Jan 22, 2004
- TOKYO ELECTRON LIMITED
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20040007182
- Publication date Jan 15, 2004
- TOKYO ELECTRON LIMITED
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing device
- Publication number 20030148623
- Publication date Aug 7, 2003
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor manufacturing apparatus
- Publication number 20020111000
- Publication date Aug 15, 2002
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20020076367
- Publication date Jun 20, 2002
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20020066536
- Publication date Jun 6, 2002
- TOKYO ELECTRON LIMITED
- Toshiaki Hongoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshiaki Hongoh

Person

Patents Grantslast 30 patents

Method and apparatus for forming insulating layer

Plasma processing apparatus

Plasma process apparatus

Plasma processing apparatus

Microwave plasma processing apparatus for controlling a temperature...

Plasma processing apparatus

Semiconductor manufacturing apparatus

Semiconductor manufacturing method and semiconductor manufacturing...

Microwave plasma processing apparatus having a vacuum pump located...

Flat antenna having rounded slot openings and plasma processing app...

Flat antenna having openings provided with conductive materials acc...

Plasma process apparatus

Plasma processing apparatus

Plasma process apparatus

Electrostatic chuck device

Patents Applicationslast 30 patents

Method and apparatus for forming insulating layer

Plasma Processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing device

Semiconductor manufacturing apparatus

Plasma processing apparatus

Plasma processing apparatus