Toshiaki Nishida

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Kudamatsu, JP

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Patents Grantslast 30 patents

Information Patent Grant
Dry etching method
- Patent number 8,207,066
- Issue date Jun 26, 2012
- Hitachi High-Technologies Corporation
- Yoshiharu Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 7,442,651
- Issue date Oct 28, 2008
- Hitachi High-Technologies Corporation
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor devices
- Patent number 7,364,956
- Issue date Apr 29, 2008
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230282491
- Publication date Sep 7, 2023
- HITACHI HIGH-TECH CORPORATION
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD USING SAME
- Publication number 20180047595
- Publication date Feb 15, 2018
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD
- Publication number 20100255612
- Publication date Oct 7, 2010
- Hitachi High-Technologies Corporation
- Yoshiharu INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching method
- Publication number 20070134922
- Publication date Jun 14, 2007
- Masahito Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching method
- Publication number 20070090090
- Publication date Apr 26, 2007
- Koichi Nakaune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor devices
- Publication number 20070026611
- Publication date Feb 1, 2007
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS