Toshifumi Nagaiwa

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for adjusting a critical dimension in a high aspect ratio fe...
- Patent number 7,732,340
- Issue date Jun 8, 2010
- Tokyo Electron Limited
- Toshifumi Nagaiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Worktable device and plasma processing apparatus for semiconductor...
- Patent number 6,723,202
- Issue date Apr 20, 2004
- Tokyo Electron Limited
- Toshifumi Nagaiwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTRODE PLATE, ELECTRODE SUPPORTI...
- Publication number 20080156441
- Publication date Jul 3, 2008
- TOKYO ELECTRON LIMITED
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ADJUSTING A CRITICAL DIMENSION IN A HIGH ASPECT RATIO FE...
- Publication number 20080038673
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Toshifumi Nagaiwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus, and electrode plate, electrode support...
- Publication number 20030155078
- Publication date Aug 21, 2003
- TOKYO ELECTRON LIMITED
- Masahiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Worktable device and plasma processing apparatus for semiconductor...
- Publication number 20020029745
- Publication date Mar 14, 2002
- Toshifumi Nagaiwa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...