Toshifumi Yokoyama

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Halftone phase shift photomask and blank for halftone phase shift p...
- Patent number 6,869,736
- Issue date Mar 22, 2005
- Dai Nippon Printing Co., Ltd.
- Hiro-o Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask and blanks for halftone phase shift...
- Patent number 6,764,792
- Issue date Jul 20, 2004
- Dai Nippon Printing Co., Ltd.
- Junji Fujikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 6,740,455
- Issue date May 25, 2004
- Dainippon Printing Co., Ltd.
- Kenji Noguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask and blank for halftone phase shift p...
- Patent number 6,599,667
- Issue date Jul 29, 2003
- Dai Nippon Printing Co., Ltd.
- Satoshi Yusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blank for halftone phase shift photomask and halftone phase shift p...
- Patent number 6,458,496
- Issue date Oct 1, 2002
- Dai Nippon Printing Co., Ltd.
- Toshiaki Motonaga
- B32 - LAYERED PRODUCTS
Information Patent Grant
Phase shift mask and method of producing the same
- Patent number 5,972,543
- Issue date Oct 26, 1999
- Dai Nippon Printing Co., Ltd.
- Toshifumi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method of producing the same
- Patent number 5,811,208
- Issue date Sep 22, 1998
- Dai Nippon Printing Co., Ltd.
- Toshifumi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift photomask and phase shift photomask dry etching method
- Patent number 5,723,234
- Issue date Mar 3, 1998
- Dai Nippon Printing Co., Ltd.
- Toshifumi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Halftone phase shift photomask and blank for halftone phase shift p...
- Publication number 20030186135
- Publication date Oct 2, 2003
- Hiro-o Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask
- Publication number 20020119379
- Publication date Aug 29, 2002
- Kenji Noguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift photomask and blank for halftone phase shift p...
- Publication number 20020039689
- Publication date Apr 4, 2002
- Satoshi Yusa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Blank for halftone phase shift photomask and halftone phase shift p...
- Publication number 20010005564
- Publication date Jun 28, 2001
- Toshiaki Motonaga
- B32 - LAYERED PRODUCTS

Toshifumi Yokoyama

Person

Patents Grantslast 30 patents

Halftone phase shift photomask and blank for halftone phase shift p...

Halftone phase shift photomask and blanks for halftone phase shift...

Photomask

Halftone phase shift photomask and blank for halftone phase shift p...

Blank for halftone phase shift photomask and halftone phase shift p...

Phase shift mask and method of producing the same

Phase shift mask and method of producing the same

Phase shift photomask and phase shift photomask dry etching method

Patents Applicationslast 30 patents

Halftone phase shift photomask and blank for halftone phase shift p...

Photomask

Halftone phase shift photomask and blank for halftone phase shift p...

Blank for halftone phase shift photomask and halftone phase shift p...