Toshiharu WADA

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Miyagi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method and process for forming memory hole patterns
- Patent number 11,049,721
- Issue date Jun 29, 2021
- Tokyo Electron Limited
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching
- Patent number 10,128,085
- Issue date Nov 13, 2018
- Tokyo Electron Limited
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching
- Patent number 9,847,231
- Issue date Dec 19, 2017
- Tokyo Electron Limited
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,583,317
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method and Process for Forming Memory Hole Patterns
- Publication number 20210035981
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Toshiharu Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING
- Publication number 20170154784
- Publication date Jun 1, 2017
- TOKYO ELECTRON LIMITED
- Toshiharu WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PLASMA ETCHING
- Publication number 20170148610
- Publication date May 25, 2017
- TOKYO ELECTRON LIMITED
- Toshiharu WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20160225585
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Toshiharu WADA
- H01 - BASIC ELECTRIC ELEMENTS