Toshiharu Yano

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 11,782,347
- Issue date Oct 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thermosetting silicon-containing compound, composition for forming...
- Patent number 11,485,824
- Issue date Nov 1, 2022
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu Yano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 10,007,183
- Issue date Jun 26, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 9,977,330
- Issue date May 22, 2018
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic film composition, method for forming organic film and patte...
- Patent number 9,372,404
- Issue date Jun 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound for forming organic film, and organic film composition usi...
- Patent number 9,261,788
- Issue date Feb 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming resist underlayer film and patterning proce...
- Patent number 8,951,917
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Patterning process and composition for forming silicon-containing f...
- Patent number 8,951,711
- Issue date Feb 10, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming a silicon-containing resist underlayer film...
- Patent number 8,932,953
- Issue date Jan 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,859,189
- Issue date Oct 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing film, silicon-containing...
- Patent number 8,852,844
- Issue date Oct 7, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Patterning process and composition for forming silicon-containing f...
- Patent number 8,835,102
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming a silicon-containing antireflection film, s...
- Patent number 8,697,330
- Issue date Apr 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 8,652,750
- Issue date Feb 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Coated-type silicon-containing film stripping process
- Patent number 8,652,267
- Issue date Feb 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing film-forming composition, silicon-containing fil...
- Patent number 8,501,386
- Issue date Aug 6, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,343,711
- Issue date Jan 1, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide-containing film-forming composition, metal oxide-contai...
- Patent number 8,029,974
- Issue date Oct 4, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal oxide-containing film-forming composition, metal oxide-contai...
- Patent number 8,026,038
- Issue date Sep 27, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicone-containing film-forming composition, silicon-containing fi...
- Patent number 7,875,417
- Issue date Jan 25, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
Composition For Forming Metal Oxide Film, Patterning Process, And M...
- Publication number 20240153771
- Publication date May 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Edge Protection Film Forming Method, Patterning Process, And...
- Publication number 20240087905
- Publication date Mar 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATT...
- Publication number 20230305405
- Publication date Sep 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND M...
- Publication number 20230280648
- Publication date Sep 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING...
- Publication number 20230274936
- Publication date Aug 31, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yasuyuki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20230168585
- Publication date Jun 1, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING FILLING FILM FOR INHIBITING SEMICONDUCTOR SUBS...
- Publication number 20230152702
- Publication date May 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20230152695
- Publication date May 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Hironori SATOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
- Publication number 20210011384
- Publication date Jan 14, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...
- Publication number 20200216670
- Publication date Jul 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Toshiharu YANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS
- Publication number 20200090935
- Publication date Mar 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20160027653
- Publication date Jan 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20160018735
- Publication date Jan 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...
- Publication number 20140342289
- Publication date Nov 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...
- Publication number 20130337649
- Publication date Dec 19, 2013
- Seiichiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTE...
- Publication number 20130302990
- Publication date Nov 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM...
- Publication number 20130045601
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCE...
- Publication number 20130005150
- Publication date Jan 3, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNING PROCESS
- Publication number 20120276483
- Publication date Nov 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...
- Publication number 20120238095
- Publication date Sep 20, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...
- Publication number 20120052685
- Publication date Mar 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming a silicon-containing antireflection film, s...
- Publication number 20100285407
- Publication date Nov 11, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Patterning process
- Publication number 20100273110
- Publication date Oct 28, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coated-type silicon-containing film stripping process
- Publication number 20100147334
- Publication date Jun 17, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal oxide-containing film-forming composition, metal oxide-contai...
- Publication number 20100086872
- Publication date Apr 8, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for forming silicon-containing film, silicon-containing...
- Publication number 20100086870
- Publication date Apr 8, 2010
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAI...
- Publication number 20090136869
- Publication date May 28, 2009
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...
- Publication number 20090011372
- Publication date Jan 8, 2009
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FI...
- Publication number 20080274432
- Publication date Nov 6, 2008
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Toshiharu Yano

Person

Patents Grantslast 30 patents

Composition for forming organic film, patterning process, and polymer

Thermosetting silicon-containing compound, composition for forming...

Compound for forming organic film, and organic film composition usi...

Compound for forming organic film, and organic film composition usi...

Organic film composition, method for forming organic film and patte...

Compound for forming organic film, and organic film composition usi...

Composition for forming resist underlayer film and patterning proce...

Patterning process and composition for forming silicon-containing f...

Composition for forming a silicon-containing resist underlayer film...

Patterning process

Composition for forming silicon-containing film, silicon-containing...

Patterning process and composition for forming silicon-containing f...

Composition for forming a silicon-containing antireflection film, s...

Silicon-containing film-forming composition, silicon-containing fil...

Coated-type silicon-containing film stripping process

Silicon-containing film-forming composition, silicon-containing fil...

Patterning process

Metal oxide-containing film-forming composition, metal oxide-contai...

Metal oxide-containing film-forming composition, metal oxide-contai...

Silicone-containing film-forming composition, silicon-containing fi...

Patents Applicationslast 30 patents

Composition For Forming Metal Oxide Film, Patterning Process, And M...

Wafer Edge Protection Film Forming Method, Patterning Process, And...

COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATT...

COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND M...

PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

MATERIAL FOR FORMING FILLING FILM FOR INHIBITING SEMICONDUCTOR SUBS...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER

THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING...

PATTERNING PROCESS

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...

COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USI...

ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTE...

COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCE...

PATTERNING PROCESS

PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING F...

SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...

Composition for forming a silicon-containing antireflection film, s...

Patterning process

Coated-type silicon-containing film stripping process

Metal oxide-containing film-forming composition, metal oxide-contai...

Composition for forming silicon-containing film, silicon-containing...

METAL OXIDE-CONTAINING FILM-FORMING COMPOSITION, METAL OXIDE-CONTAI...

SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FIL...

SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FI...