Toshihiko Akahori

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Process for producing printed wiring board and photosensitive resin...
- Patent number 7,338,751
- Issue date Mar 4, 2008
- Hitachi Chemical Co., Ltd.
- Toshihiko Akahori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Patent number 7,163,644
- Issue date Jan 16, 2007
- Hitachi Chemical Company, Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Grant
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Patent number 6,783,434
- Issue date Aug 31, 2004
- Hitachi Chemical Company, Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Grant
Photosensitive resin composition and application of its photosensit...
- Patent number 6,060,215
- Issue date May 9, 2000
- Hitachi, Ltd.
- Jin Amanokura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Production of color filter
- Patent number 5,827,626
- Issue date Oct 27, 1998
- Hitachi Chemical Co., Ltd.
- Yuji Kobayashi
- G02 - OPTICS
Information Patent Grant
Colored image forming material and color filter obtained therefrom
- Patent number 5,821,016
- Issue date Oct 13, 1998
- Hitachi Chemical Company, Ltd.
- Tsutomu Satoh
- G02 - OPTICS
Information Patent Grant
Negative type photosensitive electrodepositing resin composition
- Patent number 5,403,698
- Issue date Apr 4, 1995
- Hitachi Chemical Company, Ltd.
- Sigeo Tachiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photosensitive anionic electrodeposition coating resi...
- Patent number 5,279,923
- Issue date Jan 18, 1994
- Hitachi Chemical Company, Ltd.
- Masahiko Hiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photosensitive anionic electrodeposition coating resi...
- Patent number 5,230,984
- Issue date Jul 27, 1993
- Hitachi Chemical Company, Ltd.
- Shigeo Tachiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20060197054
- Publication date Sep 7, 2006
- Hitachi Chemical Co., Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20060186372
- Publication date Aug 24, 2006
- Hitachi Chemical Co., Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20050269295
- Publication date Dec 8, 2005
- Hitachi Chemical Company Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20050118820
- Publication date Jun 2, 2005
- Hitachi Chemical Company Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
CMP abrasive, liquid additive for CMP abrasive and method for polis...
- Publication number 20040147206
- Publication date Jul 29, 2004
- Hitachi Chemical Company Ltd.
- Toshihiko Akahori
- B24 - GRINDING POLISHING
Information Patent Application
Method for manufacturing printeed wiring board and photosensitive r...
- Publication number 20040086801
- Publication date May 6, 2004
- Toshihiko Akahori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Toshihiko Akahori

Person

Patents Grantslast 30 patents

Process for producing printed wiring board and photosensitive resin...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Photosensitive resin composition and application of its photosensit...

Production of color filter

Colored image forming material and color filter obtained therefrom

Negative type photosensitive electrodepositing resin composition

Positive type photosensitive anionic electrodeposition coating resi...

Positive type photosensitive anionic electrodeposition coating resi...

Patents Applicationslast 30 patents

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

CMP abrasive, liquid additive for CMP abrasive and method for polis...

Method for manufacturing printeed wiring board and photosensitive r...