Toshihiko Fujii

Person

Gunma-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Organic film composition, method for forming organic film and patte...
- Patent number 9,372,404
- Issue date Jun 21, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a resist under layer film and patterning process
- Patent number 9,230,827
- Issue date Jan 5, 2016
- Shin-Etsu Chemical Co., Ltd.
- Shiori Nonaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for resist underlayer film, process for forming resist...
- Patent number 9,076,738
- Issue date Jul 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,877,422
- Issue date Nov 4, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,853,031
- Issue date Oct 7, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film composition, process for forming resist unde...
- Patent number 8,835,092
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,663,898
- Issue date Mar 4, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist underlayer film, patterning process using...
- Patent number 8,652,757
- Issue date Feb 18, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition, process for forming res...
- Patent number 8,603,732
- Issue date Dec 10, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,592,956
- Issue date Nov 26, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist underlayer film, patterning process using...
- Patent number 8,450,048
- Issue date May 28, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist undercoat-forming material and patterning process
- Patent number 8,338,078
- Issue date Dec 25, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist lower layer material, resist lower layer substrate comprisin...
- Patent number 7,871,761
- Issue date Jan 18, 2011
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Bottom resist layer composition and patterning process using the same
- Patent number 7,745,104
- Issue date Jun 29, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist undercoat-forming material and patterning process
- Patent number 7,632,624
- Issue date Dec 15, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 7,550,247
- Issue date Jun 23, 2009
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist undercoat-forming material and patterning process
- Patent number 7,510,820
- Issue date Mar 31, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-curable resin composition, patterning process, and substrate...
- Patent number 6,899,991
- Issue date May 31, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Organosiloxane polymer, photo-curable resin composition, patterning...
- Patent number 6,867,325
- Issue date Mar 15, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition and patterning process
- Patent number 6,866,982
- Issue date Mar 15, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonyldiazomethanes, photoacid generators, resist compositions, a...
- Patent number 6,713,612
- Issue date Mar 30, 2004
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition suitable for lift-off technique and pat...
- Patent number 6,440,646
- Issue date Aug 27, 2002
- Shin-Etsu Chemical Co., Ltd.
- Takafumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition suitable for lift-off technique and pat...
- Patent number 6,210,855
- Issue date Apr 3, 2001
- Shin-Etsu Chemical Co., Ltd.
- Takafumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS
- Publication number 20140335692
- Publication date Nov 13, 2014
- Shin-Etsu Chemical Co., Ltd.
- Shiori NONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTE...
- Publication number 20130302990
- Publication date Nov 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS USING...
- Publication number 20130184404
- Publication date Jul 18, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...
- Publication number 20120184103
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...
- Publication number 20120171868
- Publication date Jul 5, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...
- Publication number 20120142193
- Publication date Jun 7, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...
- Publication number 20120108071
- Publication date May 3, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM, PROCESS FOR FORMING RESIST...
- Publication number 20120045900
- Publication date Feb 23, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takeru WATANABE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDE...
- Publication number 20110195362
- Publication date Aug 11, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RES...
- Publication number 20110177459
- Publication date Jul 21, 2011
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS
- Publication number 20100104977
- Publication date Apr 29, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for forming resist underlayer film, patterning process using...
- Publication number 20100099044
- Publication date Apr 22, 2010
- SHIN-ETSU CHEMICAL CO.,LTD.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bottom resist layer composition and patterning process using the same
- Publication number 20080038662
- Publication date Feb 14, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist lower layer material, resist lower layer substrate comprisin...
- Publication number 20080032231
- Publication date Feb 7, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist undercoat-forming material and patterning process
- Publication number 20070275325
- Publication date Nov 29, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist undercoat-forming material and patterning process
- Publication number 20070122740
- Publication date May 31, 2007
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and patterning process
- Publication number 20060040206
- Publication date Feb 23, 2006
- Shin-Etsu Chemical Co., Ltd.
- Mutsuo Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel sulfonyldiazomethanes, photoacid generators, resist compositi...
- Publication number 20030224298
- Publication date Dec 4, 2003
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resist composition and patterning process
- Publication number 20030175617
- Publication date Sep 18, 2003
- Hideto Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo-curable resin composition, patterning process, and substrate...
- Publication number 20030113662
- Publication date Jun 19, 2003
- Hideto Kato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Organosiloxane polymer, photo-curable resin composition, patterning...
- Publication number 20030064168
- Publication date Apr 3, 2003
- Shin-Etsu Chemical Co., Ltd.
- Hideto Kato
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Positive resist composition suitable for lift-off technique and pat...
- Publication number 20010018160
- Publication date Aug 30, 2001
- Shin-Etsu Chemical Co., Ltd.
- Takafumi Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Surface treatment agent for resist pattern, and patterning process
- Publication number 20010012601
- Publication date Aug 9, 2001
- Toshihiko Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshihiko Fujii

Person

Patents Grantslast 30 patents

Organic film composition, method for forming organic film and patte...

Method for forming a resist under layer film and patterning process

Composition for resist underlayer film, process for forming resist...

Resist underlayer film composition and patterning process using the...

Resist underlayer film composition and patterning process using the...

Resist underlayer film composition, process for forming resist unde...

Resist underlayer film composition and patterning process using the...

Method for forming resist underlayer film, patterning process using...

Resist underlayer film-forming composition, process for forming res...

Resist underlayer film composition and patterning process using the...

Method for forming resist underlayer film, patterning process using...

Photoresist undercoat-forming material and patterning process

Resist lower layer material, resist lower layer substrate comprisin...

Bottom resist layer composition and patterning process using the same

Photoresist undercoat-forming material and patterning process

Resist composition and patterning process

Resist undercoat-forming material and patterning process

Photo-curable resin composition, patterning process, and substrate...

Organosiloxane polymer, photo-curable resin composition, patterning...

Resist composition and patterning process

Sulfonyldiazomethanes, photoacid generators, resist compositions, a...

Positive resist composition suitable for lift-off technique and pat...

Positive resist composition suitable for lift-off technique and pat...

Patents Applicationslast 30 patents

METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS

ORGANIC FILM COMPOSITION, METHOD FOR FORMING ORGANIC FILM AND PATTE...

METHOD FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS USING...

RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...

RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...

RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...

RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...

COMPOSITION FOR RESIST UNDERLAYER FILM, PROCESS FOR FORMING RESIST...

RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDE...

RESIST UNDERLAYER FILM-FORMING COMPOSITION, PROCESS FOR FORMING RES...

PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS

Method for forming resist underlayer film, patterning process using...

Bottom resist layer composition and patterning process using the same

Resist lower layer material, resist lower layer substrate comprisin...

Photoresist undercoat-forming material and patterning process

Resist undercoat-forming material and patterning process

Resist composition and patterning process

Novel sulfonyldiazomethanes, photoacid generators, resist compositi...

Resist composition and patterning process

Photo-curable resin composition, patterning process, and substrate...

Organosiloxane polymer, photo-curable resin composition, patterning...

Positive resist composition suitable for lift-off technique and pat...

Surface treatment agent for resist pattern, and patterning process