Toshihiko Imai

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Fukushima, JP

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Patents Grantslast 30 patents

Information Patent Grant
Automatic localized substrate analysis device and analysis method
- Patent number 10,151,727
- Issue date Dec 11, 2018
- IAS, INC
- Katsuhiko Kawabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for measuring and estimating the cleanlines...
- Patent number 5,793,833
- Issue date Aug 11, 1998
- Shin-Etsu Handotai Co., Ltd.
- Toshihiko Imai
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
AUTOMATIC LOCALIZED SUBSTRATE ANALYSIS DEVICE AND ANALYSIS METHOD
- Publication number 20170160233
- Publication date Jun 8, 2017
- IAS Inc.
- Katsuhiko Kawabata
- G01 - MEASURING TESTING
Information Patent Application
Method for Producing Polishing Agent, Polishing Agent Produced Ther...
- Publication number 20080125016
- Publication date May 29, 2008
- Shin-Etsu Handotai Co., Ltd.
- Mikio Nakamura
- B24 - GRINDING POLISHING
Information Patent Application
Silicon single crystal, a silicon wafer, an apparatus for producing...
- Publication number 20070158653
- Publication date Jul 12, 2007
- Shin-Etsu Handotai Co., Ltd.
- Makoto Iida
- C30 - CRYSTAL GROWTH