Toshihiko Iwao

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Hard mask deposition using direct current superimposed radio freque...
- Patent number 11,773,484
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclic low temperature film growth processes
- Patent number 11,605,536
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,139,147
- Issue date Oct 5, 2021
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ALD PROCESS WITH PLASMA TREATMENT
- Publication number 20240203706
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230295797
- Publication date Sep 21, 2023
- Tokyo Electron Limited
- Nobuo MATSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclic Low Temperature Film Growth Processes
- Publication number 20230154745
- Publication date May 18, 2023
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Enhanced Film Formation Method
- Publication number 20230143204
- Publication date May 11, 2023
- TOKYO ELECTRON LIMITED
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230017876
- Publication date Jan 19, 2023
- Tokyo Electron Limited
- Toshihiko IWAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC LOW TEMPERATURE FILM GROWTH PROCESSES
- Publication number 20220093395
- Publication date Mar 24, 2022
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Hard Mask Deposition Using Direct Current Superimposed Radio Freque...
- Publication number 20210404055
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshihiko Iwao

Person

Patents Grantslast 30 patents

Hard mask deposition using direct current superimposed radio freque...

Cyclic low temperature film growth processes

Plasma processing apparatus

Patents Applicationslast 30 patents

ALD PROCESS WITH PLASMA TREATMENT

FILM FORMING METHOD AND FILM FORMING APPARATUS

Cyclic Low Temperature Film Growth Processes

Plasma Enhanced Film Formation Method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CYCLIC LOW TEMPERATURE FILM GROWTH PROCESSES

Hard Mask Deposition Using Direct Current Superimposed Radio Freque...