Toshihiko Katsura

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,407,863
- Issue date Apr 18, 1995
- Kabushiki Kaisha Toshiba
- Toshihiko Katsura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for detecting an end point of etching in semiconductor manuf...
- Patent number 5,261,998
- Issue date Nov 16, 1993
- Kabushiki Kaisha Toshiba
- Shigehiko Kanetake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling metal thin film formation conditions
- Patent number 5,175,115
- Issue date Dec 29, 1992
- Kabushiki Kaisha Toshiba
- Masahiro Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layered wiring structure of semiconductor integrated circuit...
- Patent number 5,103,287
- Issue date Apr 7, 1992
- Kabushiki Kaisha Toshiba
- Yasukazu Mase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithographic method for manufacturing semiconductor wiring pat...
- Patent number 4,952,528
- Issue date Aug 28, 1990
- Kabushiki Kaisha Toshiba
- Masahiro Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering device
- Patent number 4,933,063
- Issue date Jun 12, 1990
- Kabushiki Kaisha Toshiba
- Toshihiko Katsura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering chamber structure for high-frequency bias sputtering pro...
- Patent number 4,897,172
- Issue date Jan 30, 1990
- Kabushiki Kaisha Toshiba
- Toshihiko Katsura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshihiko Katsura

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Method for detecting an end point of etching in semiconductor manuf...

Method of controlling metal thin film formation conditions

Multi-layered wiring structure of semiconductor integrated circuit...

Photolithographic method for manufacturing semiconductor wiring pat...

Sputtering device

Sputtering chamber structure for high-frequency bias sputtering pro...