Toshihiko Maeda

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Membrane for use in X-ray mask and method for preparing the same
- Patent number 4,940,851
- Issue date Jul 10, 1990
- Research Development Corporation of Japan
- Akira Oyobe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY