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Toshihiro Hayami
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Hyogo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma control apparatus
Patent number
11,195,697
Issue date
Dec 7, 2021
SPP Technologies Co., Ltd.
Toshihiro Hayami
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Metal filling apparatus
Patent number
9,199,303
Issue date
Dec 1, 2015
Sumitomo Precision Products Co., LTD
Yukitaka Yamaguchi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processor
Patent number
8,852,388
Issue date
Oct 7, 2014
SPP Technologies Co., Ltd.
Toshihiro Hayami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus
Patent number
8,771,461
Issue date
Jul 8, 2014
SPP Technologies Co., Ltd.
Toshihiro Hayami
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for detecting etching endpoint, and etching apparatus and et...
Patent number
6,669,810
Issue date
Dec 30, 2003
Sumitomo Metal Industries, Ltd.
Toshiya Miyazaki
B24 - GRINDING POLISHING
Information
Patent Grant
Etching apparatus and etching system using the method thereof
Patent number
6,149,761
Issue date
Nov 21, 2000
Sumitomo Metal Industries Limited
Toshiya Miyazaki
B24 - GRINDING POLISHING
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
6,092,486
Issue date
Jul 25, 2000
Sumimoto Metal Indsutries, Ltd.
Hiroshi Mabuchi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus utilizing a microwave window having a t...
Patent number
6,091,045
Issue date
Jul 18, 2000
Sumitomo Metal Industries, Inc.
Hiroshi Mabuchi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
5,951,887
Issue date
Sep 14, 1999
Sumitomo Metal Industries, Ltd.
Hiroshi Mabuchi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for detecting etching endpoint, and etching apparatus and et...
Patent number
5,885,472
Issue date
Mar 23, 1999
Sumitomo Metal Industries Limited
Toshiya Miyazaki
B24 - GRINDING POLISHING
Information
Patent Grant
Plasma processing apparatus
Patent number
5,705,019
Issue date
Jan 6, 1998
Sumitomo Metal Industries, Ltd.
Minoru Yamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for detecting etching endpoint and etching apparatus and etc...
Patent number
5,626,714
Issue date
May 6, 1997
Sumitomo Metal Industries Limited
Toshiya Miyazaki
B24 - GRINDING POLISHING
Patents Applications
last 30 patents
Information
Patent Application
PLASMA CONTROL APPARATUS
Publication number
20180315581
Publication date
Nov 1, 2018
SPP TECHNOLOGIES CO., LTD.
Toshihiro HAYAMI
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
Plasma Processing Apparatus and Coil Used Therein
Publication number
20160358748
Publication date
Dec 8, 2016
SPP TECHNOLOGIES CO., LTD.
Toshihiro Hayami
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Heating Device and Plasma Processing Apparatus Provided Therewith
Publication number
20160153091
Publication date
Jun 2, 2016
SPP TECHNOLOGIES CO., LTD.
Toshihiro Hayami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Plasma Processing Apparatus and Opening and Closing Mechanism used...
Publication number
20160118225
Publication date
Apr 28, 2016
SPP TECHNOLOGIES CO., LTD.
Toshihiro Hayami
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Metal Filling Apparatus
Publication number
20140246163
Publication date
Sep 4, 2014
SUMITOMO PRECISION PRODUCTS CO., LTD.
Yukitaka Yamaguchi
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20110005684
Publication date
Jan 13, 2011
Toshihiro Hayami
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSOR
Publication number
20100043973
Publication date
Feb 25, 2010
Toshihiro Hayami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...