Toshihiro Iizuka

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device including a plurality of nitride semiconductor...
- Patent number 10,658,469
- Issue date May 19, 2020
- Renesas Electronics Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a metal-insulator-metal (MIM) capacitor havi...
- Patent number 8,815,678
- Issue date Aug 26, 2014
- Renesas Electronics Corporation
- Toshihiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 8,440,521
- Issue date May 14, 2013
- Renesas Electronics Corporation
- Naomi Fukumaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a thin film capacitor of a MIM (metal-i...
- Patent number 8,212,299
- Issue date Jul 3, 2012
- Renesas Electronics Corporation
- Toshihiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device with complementary transistors that include ha...
- Patent number 8,188,547
- Issue date May 29, 2012
- Renesas Electronics Corporation
- Kenzo Manabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insulator-metal (MIM) capacitor having capacitor dielectric m...
- Patent number 8,169,013
- Issue date May 1, 2012
- Renesas Electronics Corporation
- Toshihiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for manufacturing a semiconductor device comprising a metal...
- Patent number 7,943,475
- Issue date May 17, 2011
- Renesas Electronics Corporation
- Tomoe Yamamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming capacitor
- Patent number 6,875,667
- Issue date Apr 5, 2005
- NEC Electronics Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for fabricating capacitor having dielectric layer with perv...
- Patent number 6,602,722
- Issue date Aug 5, 2003
- NEC Corporation
- Ichiro Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a high dielectric constant metal oxide capaci...
- Patent number 6,596,602
- Issue date Jul 22, 2003
- NEC Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DRAM having a stacked capacitor and a method for fabricating the same
- Patent number 6,448,597
- Issue date Sep 10, 2002
- NEC Corporation
- Naoki Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device production method
- Patent number 6,338,996
- Issue date Jan 15, 2002
- NEC Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having thin film capac...
- Patent number 6,326,258
- Issue date Dec 4, 2001
- NEC Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20170047409
- Publication date Feb 16, 2017
- RENESAS ELECTRONICS CORPORATION
- Toshihiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A METAL-INSULATOR-METAL (MIM) CAPACITOR HAVI...
- Publication number 20140327064
- Publication date Nov 6, 2014
- Toshihiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A THIN FILM CAPACITOR AND METHOD FOR FA...
- Publication number 20120261735
- Publication date Oct 18, 2012
- RENESAS ELECTRONICS CORPORATION
- Toshihiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20120028455
- Publication date Feb 2, 2012
- RENESAS ELECTRONICS CORPORATION
- Naomi FUKUMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20100327366
- Publication date Dec 30, 2010
- NEC ELECTRONICS CORPORATION
- Kenzo MANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20100176456
- Publication date Jul 15, 2010
- Daisuke Ikeno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A METAL-INSULATOR-METAL (MIM) CAPACITOR HAVI...
- Publication number 20080064147
- Publication date Mar 13, 2008
- NEC Corporation
- Toshihiro IIZUKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating a metal insulator-metal (MIM) capacitor havi...
- Publication number 20070152256
- Publication date Jul 5, 2007
- Toshihiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and manufacturing process therefor
- Publication number 20060121671
- Publication date Jun 8, 2006
- NEC ELECTRONICS CORPORATION
- Tomoe Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a thin film capacitor and method for fa...
- Publication number 20050051824
- Publication date Mar 10, 2005
- Toshihiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and manufacturing process therefor
- Publication number 20040217478
- Publication date Nov 4, 2004
- Tomoe Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming capacitor
- Publication number 20040072401
- Publication date Apr 15, 2004
- NEC ELECTRONICS CORPORATION
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a thin film capacitor and method for fa...
- Publication number 20020190294
- Publication date Dec 19, 2002
- Toshihiro Iizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for fabricating capacitor having dielectric layer with perv...
- Publication number 20020119617
- Publication date Aug 29, 2002
- NEC Corporation
- Ichiro Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for fabricating a semiconductor device
- Publication number 20020102810
- Publication date Aug 1, 2002
- NEC Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory device production method
- Publication number 20020019109
- Publication date Feb 14, 2002
- NEC Corporation
- Toshihiro Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for fabricating capacitor having dielectric layer with pero...
- Publication number 20010004533
- Publication date Jun 21, 2001
- Ichiro Yamamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshihiro Iizuka

Person

Patents Grantslast 30 patents

Semiconductor device including a plurality of nitride semiconductor...

Method for fabricating a metal-insulator-metal (MIM) capacitor havi...

Method of manufacturing a semiconductor device

Semiconductor device having a thin film capacitor of a MIM (metal-i...

Semiconductor device with complementary transistors that include ha...

Metal-insulator-metal (MIM) capacitor having capacitor dielectric m...

Process for manufacturing a semiconductor device comprising a metal...

Method for forming capacitor

Process for fabricating capacitor having dielectric layer with perv...

Method of fabricating a high dielectric constant metal oxide capaci...

DRAM having a stacked capacitor and a method for fabricating the same

Semiconductor memory device production method

Method of manufacturing semiconductor device having thin film capac...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING A METAL-INSULATOR-METAL (MIM) CAPACITOR HAVI...

SEMICONDUCTOR DEVICE HAVING A THIN FILM CAPACITOR AND METHOD FOR FA...

Method of manufacturing a semiconductor device

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHOD FOR FABRICATING A METAL-INSULATOR-METAL (MIM) CAPACITOR HAVI...

Method for fabricating a metal insulator-metal (MIM) capacitor havi...

Semiconductor device and manufacturing process therefor

Semiconductor device having a thin film capacitor and method for fa...

Semiconductor device and manufacturing process therefor

Method for forming capacitor

Semiconductor device having a thin film capacitor and method for fa...

Process for fabricating capacitor having dielectric layer with perv...

Method for fabricating a semiconductor device

Semiconductor memory device production method

Process for fabricating capacitor having dielectric layer with pero...