Toshihiro Morisawa

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 10,262,840
- Issue date Apr 16, 2019
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing equipment
- Patent number 9,110,461
- Issue date Aug 18, 2015
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma processing apparatus
- Patent number 8,992,721
- Issue date Mar 31, 2015
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Grant
Etching apparatus, control simulator, and semiconductor device manu...
- Patent number 8,924,001
- Issue date Dec 30, 2014
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus, analysis apparatus, etching treatment method, an...
- Patent number 8,486,290
- Issue date Jul 16, 2013
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Manufacturing method of semiconductor photonic device substrate
- Patent number 8,367,431
- Issue date Feb 5, 2013
- Hitachi Cable, Ltd.
- Toshihiro Morisawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching process state judgment method and system therefor
- Patent number 8,282,849
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140277626
- Publication date Sep 18, 2014
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING EQUIPMENT
- Publication number 20130173042
- Publication date Jul 4, 2013
- Hitachi High-Technologies Corporation
- Toshihiro Morisawa
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
ETCHING APPARATUS, CONTROL SIMULATOR,AND SEMICONDUCTOR DEVICE MANUF...
- Publication number 20120310403
- Publication date Dec 6, 2012
- Toshihiro Morisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS, ANALYSIS APPARATUS, ETCHING TREATMENT METHOD, AN...
- Publication number 20110315661
- Publication date Dec 29, 2011
- Toshihiro Morisawa
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110083808
- Publication date Apr 14, 2011
- Hitachi High-Technologies Corporation
- Akira KAGOSHIMA
- G05 - CONTROLLING REGULATING
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR PHOTONIC DEVICE SUBSTRATE
- Publication number 20110003413
- Publication date Jan 6, 2011
- Hitach Cable, Ltd.
- Toshihiro Morisawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etching process state judgment method and system therefor
- Publication number 20090253222
- Publication date Oct 8, 2009
- Toshihiro Morisawa
- G01 - MEASURING TESTING

Toshihiro Morisawa

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Semiconductor manufacturing equipment

Plasma processing apparatus

Etching apparatus, control simulator, and semiconductor device manu...

Etching apparatus, analysis apparatus, etching treatment method, an...

Manufacturing method of semiconductor photonic device substrate

Etching process state judgment method and system therefor

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING EQUIPMENT

ETCHING APPARATUS, CONTROL SIMULATOR,AND SEMICONDUCTOR DEVICE MANUF...

ETCHING APPARATUS, ANALYSIS APPARATUS, ETCHING TREATMENT METHOD, AN...

PLASMA PROCESSING APPARATUS

MANUFACTURING METHOD OF SEMICONDUCTOR PHOTONIC DEVICE SUBSTRATE

Etching process state judgment method and system therefor