Toshihisa NOZAWA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming structures using a neutral beam
- Patent number 12,129,548
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus having electrostatic chuck and subst...
- Patent number 11,929,251
- Issue date Mar 12, 2024
- ASM IP Holding B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming an electronic structure using reforming gas, syst...
- Patent number 11,908,684
- Issue date Feb 20, 2024
- ASM IP Holding B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming structures using a neutral beam
- Patent number 11,643,724
- Issue date May 9, 2023
- ASM IP Holding B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma device using coaxial waveguide, and substrate treatment method
- Patent number 11,605,528
- Issue date Mar 14, 2023
- ASM IP Holding B.V.
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and apparatus
- Patent number 11,482,418
- Issue date Oct 25, 2022
- ASM IP Holding B.V.
- Akinori Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming an electronic structure using reforming gas, syst...
- Patent number 11,476,109
- Issue date Oct 18, 2022
- ASM IP Holding B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus and shower head
- Patent number 10,844,489
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Masahide Iwasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of spacer-defined direct patterning in semiconductor fabrica...
- Patent number 10,658,181
- Issue date May 19, 2020
- ASM IP Holding B.V.
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cell resonator microwave surface-wave plasma apparatus
- Patent number 10,424,462
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placing bed structure, treating apparatus using the structure, and...
- Patent number 10,388,557
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing apparatus, recording medium and wafer conveying me...
- Patent number 10,290,523
- Issue date May 14, 2019
- ASM IP Holding B.V.
- Toshihisa Nozawa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods for manufacturing semiconductor devices
- Patent number 10,262,865
- Issue date Apr 16, 2019
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 10,145,014
- Issue date Dec 4, 2018
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing and etching Si-containing film
- Patent number 9,960,033
- Issue date May 1, 2018
- ASM IP Holding B.V.
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Top dielectric quartz plate and slot antenna concept
- Patent number 9,947,516
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,947,515
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing and etching film in one processing apparatus
- Patent number 9,896,762
- Issue date Feb 20, 2018
- ASM IP Holding B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave surface-wave plasma device
- Patent number 9,793,095
- Issue date Oct 17, 2017
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate sintered integrally with gas release hole member and m...
- Patent number 9,767,994
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Masahiro Okesaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,631,274
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,574,267
- Issue date Feb 21, 2017
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,343,270
- Issue date May 17, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma treatment and method for plasma treatment
- Patent number 9,277,637
- Issue date Mar 1, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Placing bed structure, treating apparatus using the structure, and...
- Patent number 9,177,846
- Issue date Nov 3, 2015
- Tokyo Electron Limited
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, substrate processing method, pattern forming method...
- Patent number 9,117,764
- Issue date Aug 25, 2015
- Tokyo Electron Limited
- Takaaki Matsuoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma treatment device and optical monitor device
- Patent number 8,974,628
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus, plasma processing method, method for c...
- Patent number 8,973,527
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Top plate of microwave plasma processing apparatus, plasma processi...
- Patent number 8,967,080
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Valve and processing apparatus provided with the same
- Patent number 8,968,472
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Toshihisa Nozawa
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20240162037
- Publication date May 16, 2024
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...
- Publication number 20230250531
- Publication date Aug 10, 2023
- ASM IP HOLDING B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20230040728
- Publication date Feb 9, 2023
- ASM IP HOLDING B.V.
- Akinori Nakano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20230005734
- Publication date Jan 5, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS HAVING ELECTROSTATIC CHUCK AND SUBST...
- Publication number 20210166940
- Publication date Jun 3, 2021
- ASM IP HOLDING B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STRUCTURES INCLUDING DIELECTRIC LAYERS AND METHODS OF FORMING SAME
- Publication number 20210066075
- Publication date Mar 4, 2021
- ASM IP HOLDING B.V.
- Yan Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...
- Publication number 20210017648
- Publication date Jan 21, 2021
- ASM IP HOLDING B.V.
- Tomohiro Kubota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DEVICE USING COAXIAL WAVEGUIDE, AND SUBSTRATE TREATMENT METHOD
- Publication number 20210013010
- Publication date Jan 14, 2021
- ASM IP Holding B.V.
- Jun Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...
- Publication number 20200395209
- Publication date Dec 17, 2020
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SPACER-DEFINED DIRECT PATTERNING IN SEMICONDUCTOR FABRICA...
- Publication number 20190259612
- Publication date Aug 22, 2019
- ASM IP HOLDING B.V.
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20190259611
- Publication date Aug 22, 2019
- ASM IP HOLDING B.V.
- Akinori Nakano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20180301342
- Publication date Oct 18, 2018
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PROCESSING APPARATUS, RECORDING MEDIUM AND WAFER CONVEYING ME...
- Publication number 20180269088
- Publication date Sep 20, 2018
- ASM IP HOLDING B.V.
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING AND ETCHING SI-CONTAINING FILM
- Publication number 20180182614
- Publication date Jun 28, 2018
- ASM IP HOLDING B.V.
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170198395
- Publication date Jul 13, 2017
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ETCHING TRANSITION METAL FILM AND SUBSTRATE PROCESSING AP...
- Publication number 20170125261
- Publication date May 4, 2017
- TOKYO ELECTRON LIMITED
- Ryo MIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170076914
- Publication date Mar 16, 2017
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20170011886
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR DETERMINING REPLACEMENT...
- Publication number 20160189931
- Publication date Jun 30, 2016
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160189934
- Publication date Jun 30, 2016
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND SHOWER HEAD
- Publication number 20160122873
- Publication date May 5, 2016
- TOKYO ELECTRON LIMITED
- Masahide Iwasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20160071700
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND...
- Publication number 20160020135
- Publication date Jan 21, 2016
- TOKYO ELECTRON LIMITED
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Top Dielectric Quartz Plate and Slot Antenna Concept
- Publication number 20150348761
- Publication date Dec 3, 2015
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING METHOD, PATTERN FORMING METHOD...
- Publication number 20150325448
- Publication date Nov 12, 2015
- TOKYO ELECTRON LIMITED
- Takaaki MATSUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...
- Publication number 20150255258
- Publication date Sep 10, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20150211124
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150194290
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150176125
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20150159269
- Publication date Jun 11, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshihisa NOZAWA

Person

Patents Grantslast 30 patents

Method of forming structures using a neutral beam

Substrate processing apparatus having electrostatic chuck and subst...

Method of forming an electronic structure using reforming gas, syst...

Method of forming structures using a neutral beam

Plasma device using coaxial waveguide, and substrate treatment method

Substrate processing method and apparatus

Method of forming an electronic structure using reforming gas, syst...

Film forming apparatus and shower head

Method of spacer-defined direct patterning in semiconductor fabrica...

Multi-cell resonator microwave surface-wave plasma apparatus

Placing bed structure, treating apparatus using the structure, and...

Wafer processing apparatus, recording medium and wafer conveying me...

Methods for manufacturing semiconductor devices

Film forming apparatus

Method of depositing and etching Si-containing film

Top dielectric quartz plate and slot antenna concept

Microwave surface-wave plasma device

Method of depositing and etching film in one processing apparatus

Microwave surface-wave plasma device

Shower plate sintered integrally with gas release hole member and m...

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Apparatus for plasma treatment and method for plasma treatment

Placing bed structure, treating apparatus using the structure, and...

Etching method, substrate processing method, pattern forming method...

Plasma treatment device and optical monitor device

Plasma processing apparatus, plasma processing method, method for c...

Top plate of microwave plasma processing apparatus, plasma processi...

Valve and processing apparatus provided with the same

Patents Applicationslast 30 patents

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...

SUBSTRATE PROCESSING METHOD AND APPARATUS

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

SUBSTRATE PROCESSING APPARATUS HAVING ELECTROSTATIC CHUCK AND SUBST...

STRUCTURES INCLUDING DIELECTRIC LAYERS AND METHODS OF FORMING SAME

METHOD OF FORMING STRUCTURES USING A NEUTRAL BEAM, STRUCTURES FORME...

PLASMA DEVICE USING COAXIAL WAVEGUIDE, AND SUBSTRATE TREATMENT METHOD

METHOD OF FORMING AN ELECTRONIC STRUCTURE USING REFORMING GAS, SYST...

METHOD OF SPACER-DEFINED DIRECT PATTERNING IN SEMICONDUCTOR FABRICA...

SUBSTRATE PROCESSING METHOD AND APPARATUS

METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES

WAFER PROCESSING APPARATUS, RECORDING MEDIUM AND WAFER CONVEYING ME...

METHOD OF DEPOSITING AND ETCHING SI-CONTAINING FILM

PLASMA PROCESSING APPARATUS

METHOD OF ETCHING TRANSITION METAL FILM AND SUBSTRATE PROCESSING AP...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD FOR DETERMINING REPLACEMENT...

PLASMA PROCESSING APPARATUS

FILM FORMING APPARATUS AND SHOWER HEAD

PLASMA PROCESSING APPARATUS AND CLEANING METHOD

PLACING BED STRUCTURE, TREATING APPARATUS USING THE STRUCTURE, AND...

Top Dielectric Quartz Plate and Slot Antenna Concept

ETCHING METHOD, SUBSTRATE PROCESSING METHOD, PATTERN FORMING METHOD...

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...

FILM FORMING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS