Toshikatsu Wakaki

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Nirasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and constituent part thereof
- Patent number 9,337,003
- Issue date May 10, 2016
- Tokyo Electron Limited
- Takahiro Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 8,821,742
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring and plasma processing apparatus
- Patent number 7,658,816
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20100133234
- Publication date Jun 3, 2010
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONSTITUENT PART THEREOF
- Publication number 20100116437
- Publication date May 13, 2010
- TOKYO ELECTRON LIMITED
- Takahiro MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focus ring and plasma processing apparatus
- Publication number 20070169891
- Publication date Jul 26, 2007
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching apparatus
- Publication number 20060042754
- Publication date Mar 2, 2006
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS