Toshikazu Tachikawa

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of forming fine patterns
- Patent number 8,187,798
- Issue date May 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Over-coating agent for forming fine patterns and a method of formin...
- Patent number 8,142,980
- Issue date Mar 27, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Over-coating agent for forming fine patterns and a method of formin...
- Patent number 8,124,318
- Issue date Feb 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming fine patterns
- Patent number 8,043,798
- Issue date Oct 25, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming fine patterns
- Patent number 7,553,610
- Issue date Jun 30, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Fumitake Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Agent for forming coating for narrowing patterns and method for for...
- Patent number 7,235,345
- Issue date Jun 26, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming fine patterns
- Patent number 7,189,499
- Issue date Mar 13, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 7,033,731
- Issue date Apr 25, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition
- Patent number 6,936,400
- Issue date Aug 30, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Ryoichi Takasu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,864,036
- Issue date Mar 8, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for reducing pattern dimension in photoresist layer
- Patent number 6,811,817
- Issue date Nov 2, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative working resist composition
- Patent number 6,544,712
- Issue date Apr 8, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multilayered body for photolithographic patterning
- Patent number 6,455,228
- Issue date Sep 24, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photoresist composition
- Patent number 6,406,829
- Issue date Jun 18, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-amplification photoresist composition
- Patent number 6,171,749
- Issue date Jan 9, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition com...
- Patent number 5,928,837
- Issue date Jul 27, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OVER-COATING AGENT FOR FORMING FINE PATTERNS AND A METHOD OF FORMIN...
- Publication number 20100316802
- Publication date Dec 16, 2010
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING FINE PATTERNS
- Publication number 20100272909
- Publication date Oct 28, 2010
- Hiroshi Shinbori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20100139838
- Publication date Jun 10, 2010
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20100086694
- Publication date Apr 8, 2010
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20100075263
- Publication date Mar 25, 2010
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20100068662
- Publication date Mar 18, 2010
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20090186156
- Publication date Jul 23, 2009
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20090148611
- Publication date Jun 11, 2009
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20090126855
- Publication date May 21, 2009
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20090041948
- Publication date Feb 12, 2009
- Hiroshi Shinbori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20090029297
- Publication date Jan 29, 2009
- Fumitake Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20090011601
- Publication date Jan 8, 2009
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20080145539
- Publication date Jun 19, 2008
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20070213447
- Publication date Sep 13, 2007
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070190436
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070178394
- Publication date Aug 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition and method for forming resist pattern
- Publication number 20070141508
- Publication date Jun 21, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Fumitake Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20060263728
- Publication date Nov 23, 2006
- Hiroshi Shinbori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20060258809
- Publication date Nov 16, 2006
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition and process for formation of resist pat...
- Publication number 20060134545
- Publication date Jun 22, 2006
- Jyun Iwashita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist material for liquid immersion lithography process and method...
- Publication number 20060110676
- Publication date May 25, 2006
- Jyun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for reducing pattern dimension in photoresist layer
- Publication number 20060099347
- Publication date May 11, 2006
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20060079628
- Publication date Apr 13, 2006
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20060003601
- Publication date Jan 5, 2006
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating agent for forming fine patterns and a method of formin...
- Publication number 20050245663
- Publication date Nov 3, 2005
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating forming agent for reducing pattern dimension and method of...
- Publication number 20050175926
- Publication date Aug 11, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for reducing pattern dimension in photoresist layer
- Publication number 20050058950
- Publication date Mar 17, 2005
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20050014090
- Publication date Jan 20, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming fine patterns
- Publication number 20050009365
- Publication date Jan 13, 2005
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshikazu Tachikawa

Person

Patents Grantslast 30 patents

Resist composition

Method of forming fine patterns

Over-coating agent for forming fine patterns and a method of formin...

Over-coating agent for forming fine patterns and a method of formin...

Method of forming fine patterns

Method of forming fine patterns

Resist composition

Resist composition

Resist composition

Agent for forming coating for narrowing patterns and method for for...

Method of forming fine patterns

Multilayered body for photolithographic patterning

Negative resist composition

Negative-working photoresist composition

Method for reducing pattern dimension in photoresist layer

Negative working resist composition

Multilayered body for photolithographic patterning

Negative-working photoresist composition

Negative-working chemical-amplification photoresist composition

Negative-working chemical-sensitization photoresist composition com...

Patents Applicationslast 30 patents

OVER-COATING AGENT FOR FORMING FINE PATTERNS AND A METHOD OF FORMIN...

METHOD OF FORMING FINE PATTERNS

Over-coating agent for forming fine patterns and a method of formin...

Over-coating agent for forming fine patterns and a method of formin...

Over-coating agent for forming fine patterns and a method of formin...

Method of forming fine patterns

Method of forming fine patterns

Over-coating agent for forming fine patterns and a method of formin...

Over-coating agent for forming fine patterns and a method of formin...

RESIST COMPOSITION

Method of forming fine patterns

Method of forming fine patterns

Over-coating agent for forming fine patterns and a method of formin...

Method of forming fine patterns

Over-coating agent for forming fine patterns and a method of formin...

RESIST COMPOSITION

RESIST COMPOSITION

Negative resist composition and method for forming resist pattern

Method of forming fine patterns

Over-coating agent for forming fine patterns and a method of formin...

Negative resist composition and process for formation of resist pat...

Resist material for liquid immersion lithography process and method...

Method for reducing pattern dimension in photoresist layer

Over-coating agent for forming fine patterns and a method of formin...

Method of forming fine patterns

Over-coating agent for forming fine patterns and a method of formin...

Coating forming agent for reducing pattern dimension and method of...

Method for reducing pattern dimension in photoresist layer

Resist composition

Method of forming fine patterns