Toshikazu Takayama

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 11,204,551
- Issue date Dec 21, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, compound, an...
- Patent number 10,394,122
- Issue date Aug 27, 2019
- TOYKO OHKA KOGYO CO., LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 10,241,406
- Issue date Mar 26, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate having rod-like molecules on surface thereof and method f...
- Patent number 9,149,837
- Issue date Oct 6, 2015
- National University Corporation NARA Institute of Science and Technology
- Masanobu Naito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for formation of resist protection film, and method for...
- Patent number 8,409,781
- Issue date Apr 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and method of forming pattern
- Patent number 8,216,763
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material for formation of protective film, method for formation of...
- Patent number 8,097,397
- Issue date Jan 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Crosslinked positive-working photoresist composition
- Patent number 6,630,282
- Issue date Oct 7, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20170371241
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20170369697
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito YAHAGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20170369698
- Publication date Dec 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUBSTRATE HAVING ROD-LIKE MOLECULES ON SURFACE THEREOF AND METHOD F...
- Publication number 20130236947
- Publication date Sep 12, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masanobu Naito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...
- Publication number 20100086879
- Publication date Apr 8, 2010
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR...
- Publication number 20100040973
- Publication date Feb 18, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
- Publication number 20090220889
- Publication date Sep 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070190436
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070178394
- Publication date Aug 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for formation of antireflection film, and antireflectio...
- Publication number 20060292488
- Publication date Dec 28, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition
- Publication number 20050014090
- Publication date Jan 20, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Crosslinked positive-working photoresist composition
- Publication number 20020034704
- Publication date Mar 21, 2002
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshikazu Takayama

Person

Patents Grantslast 30 patents

Resist composition and method for forming resist pattern

Resist composition, method for forming resist pattern, compound, an...

Resist composition and method for forming resist pattern

Substrate having rod-like molecules on surface thereof and method f...

Composition for formation of resist protection film, and method for...

Photosensitive resin composition and method of forming pattern

Resist composition

Material for formation of protective film, method for formation of...

Resist composition

Resist composition

Resist composition

Crosslinked positive-working photoresist composition

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

SUBSTRATE HAVING ROD-LIKE MOLECULES ON SURFACE THEREOF AND METHOD F...

MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...

COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR...

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN

RESIST COMPOSITION

RESIST COMPOSITION

RESIST COMPOSITION

Composition for formation of antireflection film, and antireflectio...

Resist composition

Crosslinked positive-working photoresist composition