Toshiki Okui

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working photoresist composition for thick film formation
- Patent number 9,436,084
- Issue date Sep 6, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Koichi Misumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive photoresist composition for thick fil...
- Patent number 7,951,522
- Issue date May 31, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive photoresist composition for thick fil...
- Patent number 7,927,778
- Issue date Apr 19, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and method of forming resist pattern
- Patent number 7,462,436
- Issue date Dec 9, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative photoresist compositions for the formation of thick films,...
- Patent number 7,419,769
- Issue date Sep 2, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive photoresist composition for thick fil...
- Patent number 7,169,532
- Issue date Jan 30, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiki Okui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition and method of forming resist pattern
- Patent number 7,132,213
- Issue date Nov 7, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative photoresist compositions for the formation of thick films,...
- Patent number 7,129,018
- Issue date Oct 31, 2006
- Toyko Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive photoresist composition for thick fil...
- Patent number 7,081,327
- Issue date Jul 25, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiki Okui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photoresist compositions for the formation of thick films,...
- Patent number 7,063,934
- Issue date Jun 20, 2006
- Toyko Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified negative photoresist composition for the forma...
- Patent number 6,838,229
- Issue date Jan 4, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive photoresist composition for the formation of thick films,...
- Patent number 6,641,972
- Issue date Nov 4, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kouichi Misumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image formation method with a post exposure heating step
- Patent number 5,908,734
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Positive photoresist composition and method of forming resist pattern
- Publication number 20060210914
- Publication date Sep 21, 2006
- TOKYO OHKA KOGYO., LTD.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photoresist composition and resist pattern formation
- Publication number 20060183048
- Publication date Aug 17, 2006
- Yasuo Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and method of forming resist pattern
- Publication number 20060166131
- Publication date Jul 27, 2006
- Tokyo Ohka Kogyo, Co., LTD.
- Yasuo Masuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified positive photoresist composition for thick fil...
- Publication number 20060141386
- Publication date Jun 29, 2006
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive photoresist composition for thick fil...
- Publication number 20060141387
- Publication date Jun 29, 2006
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive photoresist composition for thick fil...
- Publication number 20060141388
- Publication date Jun 29, 2006
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR THICK FIL...
- Publication number 20060141389
- Publication date Jun 29, 2006
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist compositions for the formation of thick films,...
- Publication number 20060035169
- Publication date Feb 16, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist compositions for the formation of thick films,...
- Publication number 20060035170
- Publication date Feb 16, 2006
- Koji Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thick film photoresist layer laminate, method of manufacturing thic...
- Publication number 20030087187
- Publication date May 8, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist compositions for the formation of thick films,...
- Publication number 20030064319
- Publication date Apr 3, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive photoresist composition for the formation of thick films,...
- Publication number 20030059706
- Publication date Mar 27, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kouichi Misumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified negative photoresist composition for the forma...
- Publication number 20030039921
- Publication date Feb 27, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Toshiki Okui

Person

Patents Grantslast 30 patents

Positive-working photoresist composition for thick film formation

Chemically amplified positive photoresist composition for thick fil...

Chemically amplified positive photoresist composition for thick fil...

Positive photoresist composition and method of forming resist pattern

Negative photoresist compositions for the formation of thick films,...

Chemically amplified positive photoresist composition for thick fil...

Positive photoresist composition and method of forming resist pattern

Negative photoresist compositions for the formation of thick films,...

Chemically amplified positive photoresist composition for thick fil...

Negative photoresist compositions for the formation of thick films,...

Chemically amplified negative photoresist composition for the forma...

Positive photoresist composition for the formation of thick films,...

Image formation method with a post exposure heating step

Patents Applicationslast 30 patents

Positive photoresist composition and method of forming resist pattern

Positive photoresist composition and resist pattern formation

Positive photoresist composition and method of forming resist pattern

Chemically amplified positive photoresist composition for thick fil...

Chemically amplified positive photoresist composition for thick fil...

Chemically amplified positive photoresist composition for thick fil...

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR THICK FIL...

Negative photoresist compositions for the formation of thick films,...

Negative photoresist compositions for the formation of thick films,...

Thick film photoresist layer laminate, method of manufacturing thic...

Negative photoresist compositions for the formation of thick films,...

Positive photoresist composition for the formation of thick films,...

Chemically amplified negative photoresist composition for the forma...