Toshiki Takahashi

Person

Tokyo-To, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 8,608,902
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical plasma processing apparatus for semiconductor process
- Patent number 8,394,200
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,336,490
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treating apparatus
- Patent number 8,267,041
- Issue date Sep 18, 2012
- Tokyo Electron Limited
- Toshiji Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus of batch type
- Patent number 8,166,914
- Issue date May 1, 2012
- Tokyo Electron Limited
- Toshiki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, electrode plate for plasma processing...
- Patent number 7,922,862
- Issue date Apr 12, 2011
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical plasma processing method for forming silicon containing film
- Patent number 7,825,039
- Issue date Nov 2, 2010
- Tokyo Electron Limited
- Toshiki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming silicon-containing insulating film
- Patent number 7,758,920
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, electrode plate for plasma processing...
- Patent number 7,585,386
- Issue date Sep 8, 2009
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device and baffle plate thereof
- Patent number 7,109,660
- Issue date Sep 19, 2006
- Tokyo Electron Limited
- Hiroyuki Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,104,217
- Issue date Sep 12, 2006
- Tokyo Electron Limited
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,915,760
- Issue date Jul 12, 2005
- Tokyo Electron Limited
- Shinji Himori

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120103525
- Publication date May 3, 2012
- TOKYO ELECTON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...
- Publication number 20110162802
- Publication date Jul 7, 2011
- Katsuya OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100186898
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...
- Publication number 20090285998
- Publication date Nov 19, 2009
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing apparatus and process method
- Publication number 20090184109
- Publication date Jul 23, 2009
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...
- Publication number 20090181548
- Publication date Jul 16, 2009
- Toshiki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20090078201
- Publication date Mar 26, 2009
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20090056877
- Publication date Mar 5, 2009
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus of batch type
- Publication number 20090032190
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Toshiki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treating Apparatus
- Publication number 20080093024
- Publication date Apr 24, 2008
- Toshiji Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20070240644
- Publication date Oct 18, 2007
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...
- Publication number 20070234961
- Publication date Oct 11, 2007
- Toshiki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming silicon-containing insulating film
- Publication number 20070032047
- Publication date Feb 8, 2007
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus, electrode plate for plasma processing...
- Publication number 20050276928
- Publication date Dec 15, 2005
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing device and baffle plate thereof
- Publication number 20050167052
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Hiroyuki Ishihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exhaust ring mechanism and plasma processing apparatus using the same
- Publication number 20040129218
- Publication date Jul 8, 2004
- Toshiki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20030086840
- Publication date May 8, 2003
- Shinji Himori
- H01 - BASIC ELECTRIC ELEMENTS

Toshiki Takahashi

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Vertical plasma processing apparatus for semiconductor process

Plasma processing apparatus

Plasma treating apparatus

Plasma processing apparatus of batch type

Plasma processing apparatus, electrode plate for plasma processing...

Vertical plasma processing method for forming silicon containing film

Method and apparatus for forming silicon-containing insulating film

Plasma processing apparatus, electrode plate for plasma processing...

Plasma processing device and baffle plate thereof

Plasma processing apparatus

Plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING...

Processing apparatus and process method

VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...

VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS

Plasma processing apparatus

Plasma processing apparatus of batch type

Plasma Treating Apparatus

VERTICAL PLASMA PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS

VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...

Method and apparatus for forming silicon-containing insulating film

Plasma processing apparatus, electrode plate for plasma processing...

Plasma processing device and baffle plate thereof

Exhaust ring mechanism and plasma processing apparatus using the same

Plasma processing apparatus