Toshimasa Nakayama

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Phenol novolak resin, production process thereof, and positive phot...
- Patent number 6,939,926
- Issue date Sep 6, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Rinsing solution for lithography and method for processing substrat...
- Patent number 6,815,151
- Issue date Nov 9, 2004
- Tokyo Ohika Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for synthesizing polyp...
- Patent number 6,620,978
- Issue date Sep 16, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number RE38254
- Issue date Sep 16, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- 525 - Synthetic resins or natural rubbers
Information Patent Grant
Positive photoresist composition, substrate with a photosensitive f...
- Patent number 6,566,031
- Issue date May 20, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process and synthesizing polyp...
- Patent number 6,492,085
- Issue date Dec 10, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition comprising a phenolic compound hav...
- Patent number 6,475,694
- Issue date Nov 5, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin precursor, novolak resin and positive photoresist com...
- Patent number 6,417,317
- Issue date Jul 9, 2002
- Togyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming resist pat...
- Patent number 6,406,827
- Issue date Jun 18, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming resist pat...
- Patent number 6,379,859
- Issue date Apr 30, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer solution for acitinic ray sensitive resist
- Patent number 6,329,126
- Issue date Dec 11, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 6,312,863
- Issue date Nov 6, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Shinichi Hidesaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming resist pat...
- Patent number 6,300,033
- Issue date Oct 9, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,296,992
- Issue date Oct 2, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 6,291,142
- Issue date Sep 18, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming antireflective coating film and method for...
- Patent number 6,268,108
- Issue date Jul 31, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-ashing treating liquid compositions and a process for treatmen...
- Patent number 6,261,745
- Issue date Jul 17, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization resist composition
- Patent number 6,245,930
- Issue date Jun 12, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist stripping liquid compositions and a method of stripping...
- Patent number 6,225,034
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Post-ashing treating method for substrates
- Patent number 6,225,030
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating solution for forming silica coating and method of forming s...
- Patent number 6,214,104
- Issue date Apr 10, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Iida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,207,340
- Issue date Mar 27, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolak resin precursor, novolak resin and positive photoresist com...
- Patent number 6,207,788
- Issue date Mar 27, 2001
- Tokyo Ohka Kogya Co., Ltd.
- Ken Miyagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 6,187,500
- Issue date Feb 13, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition and process for forming contact hole
- Patent number 6,177,226
- Issue date Jan 23, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masaki Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-amplification photoresist composition
- Patent number 6,171,749
- Issue date Jan 9, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 6,159,652
- Issue date Dec 12, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid coating composition for use in forming antireflective film a...
- Patent number 6,136,505
- Issue date Oct 24, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating solution for forming antireflective coating film
- Patent number 6,132,928
- Issue date Oct 17, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist compositions and multilayer resist materials u...
- Patent number 6,127,087
- Issue date Oct 3, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Miki Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Phenol novolak resin, production process thereof, and positive phot...
- Publication number 20040167312
- Publication date Aug 26, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photoresist composition and process for synthesizing polyp...
- Publication number 20030054283
- Publication date Mar 20, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Satoshi Shimatani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition and process for forming resist pat...
- Publication number 20020119390
- Publication date Aug 29, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...
- Publication number 20020012865
- Publication date Jan 31, 2002
- TAKAKO SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photoresist composition
- Publication number 20020001769
- Publication date Jan 3, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kousuke Doi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...
- Publication number 20010053493
- Publication date Dec 20, 2001
- TAKAKO SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing solution for lithography and method for processing substrat...
- Publication number 20010038976
- Publication date Nov 8, 2001
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phenol novolak resin, production process thereof, and positive phot...
- Publication number 20010024762
- Publication date Sep 27, 2001
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Toshimasa Nakayama

Person

Patents Grantslast 30 patents

Phenol novolak resin, production process thereof, and positive phot...

Rinsing solution for lithography and method for processing substrat...

Positive photoresist composition and process for synthesizing polyp...

Positive resist composition

Positive photoresist composition, substrate with a photosensitive f...

Positive photoresist composition and process and synthesizing polyp...

Positive photoresist composition comprising a phenolic compound hav...

Novolak resin precursor, novolak resin and positive photoresist com...

Positive photoresist composition and process for forming resist pat...

Positive photoresist composition and process for forming resist pat...

Developer solution for acitinic ray sensitive resist

Positive photoresist composition

Positive photoresist composition and process for forming resist pat...

Positive photoresist composition and process for forming contact hole

Photoresist stripping liquid compositions and a method of stripping...

Composition for forming antireflective coating film and method for...

Post-ashing treating liquid compositions and a process for treatmen...

Chemical-sensitization resist composition

Photoresist stripping liquid compositions and a method of stripping...

Post-ashing treating method for substrates

Coating solution for forming silica coating and method of forming s...

Positive photoresist composition and process for forming contact hole

Novolak resin precursor, novolak resin and positive photoresist com...

Positive photoresist compositions and multilayer resist materials u...

Positive photoresist composition and process for forming contact hole

Negative-working chemical-amplification photoresist composition

Positive resist composition

Liquid coating composition for use in forming antireflective film a...

Coating solution for forming antireflective coating film

Positive photoresist compositions and multilayer resist materials u...

Patents Applicationslast 30 patents

Phenol novolak resin, production process thereof, and positive phot...

Positive photoresist composition and process for synthesizing polyp...

Positive photoresist composition and process for forming resist pat...

POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...

Positive photoresist composition

POSITIVE PHOTORESIST COMPOSITION AND PROCESS FOR FORMING RESIST PAT...

Rinsing solution for lithography and method for processing substrat...

Phenol novolak resin, production process thereof, and positive phot...