Toshimitsu Ohmine

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ammonium halide eliminator, chemical vapor deposition system and ch...
- Patent number 6,365,231
- Issue date Apr 2, 2002
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal processing apparatus with a shield between heater and subst...
- Patent number 5,991,508
- Issue date Nov 23, 1999
- Kabushiki Kaisha Toshiba
- Toshimitsu Ohmine
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 5,897,710
- Issue date Apr 27, 1999
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 5,766,360
- Issue date Jun 16, 1998
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor-phase deposition apparatus and vapor-phase deposition method
- Patent number 5,527,393
- Issue date Jun 18, 1996
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor-phase deposition apparatus and vapor-phase deposition method
- Patent number 5,474,612
- Issue date Dec 12, 1995
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas-phase growing method and apparatus for the method
- Patent number 5,230,925
- Issue date Jul 27, 1993
- Kabushiki Kaisha Toshiba
- Toshimitsu Ohmine
- C30 - CRYSTAL GROWTH
Information Patent Grant
Vapor deposition apparatus
- Patent number 5,205,870
- Issue date Apr 27, 1993
- Kabushiki Kaisha Toshiba
- Yuusuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition apparatus
- Patent number 5,151,133
- Issue date Sep 29, 1992
- Kabushiki Kaisha Toshiba
- Toshimitsu Ohmine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition system
- Patent number 5,088,444
- Issue date Feb 18, 1992
- Kabushiki Kaisha Toshiba
- Toshimitsu Ohmine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition apparatus
- Patent number 5,002,011
- Issue date Mar 26, 1991
- Kabushiki Kaisha Toshiba
- Toshimitsu Ohmine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust processing apparatus
- Patent number 4,940,213
- Issue date Jul 10, 1990
- Kabushiki Kaisha Toshiba
- Toshimitsu Ohmine
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
AMMONIUM HALIDE ELIMINATOR, CHEMICAL VAPOR DEPOSITION SYSTEM AND CH...
- Publication number 20010048973
- Publication date Dec 6, 2001
- YUUSUKE SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Toshimitsu Ohmine

Person

Patents Grantslast 30 patents

Ammonium halide eliminator, chemical vapor deposition system and ch...

Thermal processing apparatus with a shield between heater and subst...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Vapor-phase deposition apparatus and vapor-phase deposition method

Vapor-phase deposition apparatus and vapor-phase deposition method

Gas-phase growing method and apparatus for the method

Vapor deposition apparatus

Vapor deposition apparatus

Vapor deposition system

Vapor deposition apparatus

Exhaust processing apparatus

Patents Applicationslast 30 patents

AMMONIUM HALIDE ELIMINATOR, CHEMICAL VAPOR DEPOSITION SYSTEM AND CH...