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Toshio Hasegawa
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Albany, NY, US
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Patents Grants
last 30 patents
Information
Patent Grant
Resistive random accress memory containing a conformal titanium alu...
Patent number
10,361,366
Issue date
Jul 23, 2019
Tokyo Electron Limited
Takahiro Hakamata
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Integration of ALD barrier layer and CVD Ru liner for void-free Cu...
Patent number
9,607,888
Issue date
Mar 28, 2017
Tokyo Electron Limited
Kai-Hung Yu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for depositing metal layers on germanium-containing films us...
Patent number
9,330,936
Issue date
May 3, 2016
Tokyo Electron Limited
Toshio Hasegawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual workfunction semiconductor devices and methods for forming the...
Patent number
8,846,474
Issue date
Sep 30, 2014
Tokyo Electron Limited
Genji Nakamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming conformal metal silicide films
Patent number
8,785,310
Issue date
Jul 22, 2014
Tokyo Electron Limited
Toshio Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method of cleaning powdery source supply system, storage medium, su...
Patent number
8,389,053
Issue date
Mar 5, 2013
Tokyo Electron Limited
Tsuyoshi Moriya
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for in-situ refurbishing a ceramic substrate holder
Patent number
7,989,353
Issue date
Aug 2, 2011
Tokyo Electron Limited
Tadahiro Ishizaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of forming aluminum-doped metal carbonitride gate electrodes
Patent number
7,985,680
Issue date
Jul 26, 2011
Tokyo Electron Limited
Toshio Hasegawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for depositing titanium nitride films for semiconductor manu...
Patent number
7,776,733
Issue date
Aug 17, 2010
Tokyo Electron Limited
Toshio Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for depositing titanium nitride films for semiconductor manu...
Patent number
7,589,020
Issue date
Sep 15, 2009
Tokyo Electron Limited
Toshio Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
RESISTIVE RANDOM ACCRESS MEMORY CONTAINING A CONFORMAL TITANIUM ALU...
Publication number
20190044064
Publication date
Feb 7, 2019
TOKYO ELECTRON LIMITED
Takahiro Hakamata
G11 - INFORMATION STORAGE
Information
Patent Application
INTEGRATION OF ALD BARRIER LAYER AND CVD Ru LINER FOR VOID-FREE Cu...
Publication number
20150221550
Publication date
Aug 6, 2015
TOKYO ELECTRON LIMITED
Kai-Hung Yu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR DEPOSITING METAL LAYERS ON GERMANIUM-CONTAINING FILMS US...
Publication number
20150132939
Publication date
May 14, 2015
TOKYO ELECTRON LIMITED
Toshio Hasegawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DUAL WORKFUNCTION SEMICONDUCTOR DEVICES AND METHODS FOR FORMING THE...
Publication number
20140048885
Publication date
Feb 20, 2014
TOKYO ELECTRON LIMITED
Genji Nakamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF FORMING CONFORMAL METAL SILICIDE FILMS
Publication number
20130196505
Publication date
Aug 1, 2013
TOKYO ELECTRON LIMITED
Toshio Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR FORMING A SEMICONDUCTOR DEVICE
Publication number
20130149852
Publication date
Jun 13, 2013
TOKYO ELECTRON LIMITED
Genji Nakamura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF CLEANING POWDERY SOURCE SUPPLY SYSTEM, STORAGE MEDIUM, SU...
Publication number
20100136230
Publication date
Jun 3, 2010
TOKYO ELECTRON LIMITED
Tsuyoshi Moriya
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD OF FORMING ALUMINUM-DOPED METAL CARBONITRIDE GATE ELECTRODES
Publication number
20100048009
Publication date
Feb 25, 2010
TOKYO ELECTRON LIMITED
Toshio Hasegawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR IN-SITU REFURBISHING A CERAMIC SUBSTRATE HOLDER
Publication number
20090166327
Publication date
Jul 2, 2009
TOKYO ELECTRON LIMITED
Tadahiro Ishizaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR DEPOSITING TITANIUM NITRIDE FILMS FOR SEMICONDUCTOR MANU...
Publication number
20080274616
Publication date
Nov 6, 2008
TOKYO ELECTRON LIMITED
Toshio Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD FOR DEPOSITING TITANIUM NITRIDE FILMS FOR SEMICONDUCTOR MANU...
Publication number
20080274624
Publication date
Nov 6, 2008
TOKYO ELECTRON LIMITED
Toshio Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...