Toshitaka Hiraga

Person

Setagaya-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method to remove resist, etch residue, and copper oxide from substr...
- Patent number 7,718,590
- Issue date May 18, 2010
- EKC Technology, Inc.
- Tomoko Suzuki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Aqueous fluoride compositions for cleaning semiconductor devices
- Patent number 7,399,365
- Issue date Jul 15, 2008
- EKC Technology, Inc.
- Tetsuo Aoyama
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Separation-material composition for photo-resist and manufacturing...
- Patent number 7,341,827
- Issue date Mar 11, 2008
- Sony Corporation
- Masafumi Muramatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition for removing resists and method of manufacturi...
- Patent number 7,250,391
- Issue date Jul 31, 2007
- Renesas Technology Corp.
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist stripping composition and method of producing semiconductor...
- Patent number 7,087,563
- Issue date Aug 8, 2006
- Sony Corporation
- Hayato Iwamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Aqueous fluoride compositions for cleaning semiconductor devices
- Publication number 20090099051
- Publication date Apr 16, 2009
- EKC Technology, Inc.
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Separation-material composition for photo-resist and manufacturing...
- Publication number 20080076260
- Publication date Mar 27, 2008
- SONY CORPORATION
- Masafumi Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to remove resist, etch residue, and copper oxide from substr...
- Publication number 20060199749
- Publication date Sep 7, 2006
- Tomoko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Aqueous fluoride compositions for cleaning semiconductor devices
- Publication number 20050014667
- Publication date Jan 20, 2005
- Tetsuo Aoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning composition for removing resists and method of manufacturi...
- Publication number 20040106531
- Publication date Jun 3, 2004
- Renesas Technology Corp.
- Itaru Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for releasing a resist and method for manufacturing sem...
- Publication number 20040081924
- Publication date Apr 29, 2004
- Hayato Iwamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Separation-material composition for photo-resist and manufacturing...
- Publication number 20040038154
- Publication date Feb 26, 2004
- Masafumi Muramatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshitaka Hiraga

Person

Patents Grantslast 30 patents

Method to remove resist, etch residue, and copper oxide from substr...

Aqueous fluoride compositions for cleaning semiconductor devices

Separation-material composition for photo-resist and manufacturing...

Cleaning composition for removing resists and method of manufacturi...

Resist stripping composition and method of producing semiconductor...

Patents Applicationslast 30 patents

Aqueous fluoride compositions for cleaning semiconductor devices

Separation-material composition for photo-resist and manufacturing...

Method to remove resist, etch residue, and copper oxide from substr...

Aqueous fluoride compositions for cleaning semiconductor devices

Cleaning composition for removing resists and method of manufacturi...

Composition for releasing a resist and method for manufacturing sem...

Separation-material composition for photo-resist and manufacturing...