Toshiya Tsukahara

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Placing table, positioning method of edge ring and substrate proces...
- Patent number 11,664,200
- Issue date May 30, 2023
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,847,348
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus ring for semiconductor treatment and plasma treatment device
- Patent number 7,678,225
- Issue date Mar 16, 2010
- Tokyo Electron Limited
- Takaaki Nezu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust ring for semiconductor equipment
- Patent number D490450
- Issue date May 25, 2004
- Tokyo Electron Limited
- Daisuke Hayashi
- D15 - Machines not elsewhere specified

Patents Applicationslast 30 patents

Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210217649
- Publication date Jul 15, 2021
- TOKYO ELECTRON LIMITED
- Kazuhiko AKAHANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210183685
- Publication date Jun 17, 2021
- TOKYO ELECTRON LIMITED
- Sungjae LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200176226
- Publication date Jun 4, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE, POSITIONING METHOD OF EDGE RING AND SUBSTRATE PROCES...
- Publication number 20200144036
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200144090
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20180182635
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Toshiya Tsukahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Focus ring for semiconductor treatment and plasma treatment device
- Publication number 20040074605
- Publication date Apr 22, 2004
- Takaaki Nezu
- H01 - BASIC ELECTRIC ELEMENTS

Toshiya Tsukahara

Person

Patents Grantslast 30 patents

Placing table, positioning method of edge ring and substrate proces...

Plasma processing apparatus and plasma processing method

Focus ring for semiconductor treatment and plasma treatment device

Exhaust ring for semiconductor equipment

Patents Applicationslast 30 patents

EDGE RING AND SUBSTRATE PROCESSING APPARATUS

EDGE RING AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLACING TABLE, POSITIONING METHOD OF EDGE RING AND SUBSTRATE PROCES...

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

FOCUS RING AND SUBSTRATE PROCESSING APPARATUS

Focus ring for semiconductor treatment and plasma treatment device