Toshiyuki Kai

Person

Yokkaichi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer
- Patent number 8,809,476
- Issue date Aug 19, 2014
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,771,923
- Issue date Jul 8, 2014
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and polymer
- Patent number 8,470,513
- Issue date Jun 25, 2013
- JSR Corporation
- Kota Nishino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern forming method
- Patent number 8,450,045
- Issue date May 28, 2013
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,377,627
- Issue date Feb 19, 2013
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition and process for producing low-molec...
- Patent number 8,361,691
- Issue date Jan 29, 2013
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, radiation-sensitive composition, monomer, and method of pr...
- Patent number 8,334,087
- Issue date Dec 18, 2012
- JSR Corporation
- Ken Maruyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,173,351
- Issue date May 8, 2012
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming pattern and composition for forming of organic th...
- Patent number 8,173,348
- Issue date May 8, 2012
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming pattern, composition for forming upper-layer film...
- Patent number 8,119,324
- Issue date Feb 21, 2012
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type radiation sensitive resin composition
- Patent number 7,323,284
- Issue date Jan 29, 2008
- JSR Corporation
- Toshiyuki Kai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative radiation-sensitive resin composition
- Patent number 6,468,714
- Issue date Oct 22, 2002
- JSR Corporation
- Toshiyuki Kai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern formation method
- Patent number 6,403,288
- Issue date Jun 11, 2002
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20130108962
- Publication date May 2, 2013
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER
- Publication number 20130053526
- Publication date Feb 28, 2013
- JSR Corporation
- Ken MARUYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20120122036
- Publication date May 17, 2012
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20120058429
- Publication date Mar 8, 2012
- JSR Corporation
- Kota Nishino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20110117489
- Publication date May 19, 2011
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PR...
- Publication number 20100310987
- Publication date Dec 9, 2010
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC TH...
- Publication number 20100233635
- Publication date Sep 16, 2010
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM...
- Publication number 20090311622
- Publication date Dec 17, 2009
- JSR Corporation
- Hikaru Sugita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLEC...
- Publication number 20090280433
- Publication date Nov 12, 2009
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20090274977
- Publication date Nov 5, 2009
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Phenolic hydroxyl group-containing copolymer and radiation-sensitiv...
- Publication number 20060188812
- Publication date Aug 24, 2006
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Negative type radiation sensitive resin composition
- Publication number 20030022095
- Publication date Jan 30, 2003
- Toshiyuki Kai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Negative radiation-sensitive resin composition
- Publication number 20010006758
- Publication date Jul 5, 2001
- Toshiyuki Kai
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Toshiyuki Kai

Person

Patents Grantslast 30 patents

Polymer

Radiation-sensitive composition

Radiation-sensitive resin composition and polymer

Pattern forming method

Compound and radiation-sensitive composition

Radiation-sensitive composition and process for producing low-molec...

Polymer, radiation-sensitive composition, monomer, and method of pr...

Compound and radiation-sensitive composition

Method of forming pattern and composition for forming of organic th...

Method of forming pattern, composition for forming upper-layer film...

Negative type radiation sensitive resin composition

Negative radiation-sensitive resin composition

Resist pattern formation method

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION

POLYMER

PATTERN FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

COMPOUND AND RADIATION-SENSITIVE COMPOSITION

POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PR...

METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC TH...

METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM...

RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLEC...

COMPOUND AND RADIATION-SENSITIVE COMPOSITION

Phenolic hydroxyl group-containing copolymer and radiation-sensitiv...

Negative type radiation sensitive resin composition

Negative radiation-sensitive resin composition