Toshiyuki Maenosono

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Higashihiroshima, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming a semiconductor device, and a photomask used therein
- Patent number 11,569,089
- Issue date Jan 31, 2023
- Micron Technology, Inc.
- Hidenori Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming vias using silicon on insulator substrate
- Patent number 11,257,744
- Issue date Feb 22, 2022
- Micron Technology, Inc.
- Toshiyuki Maenosono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming vias using silicon on insulator substrate
- Patent number 10,418,311
- Issue date Sep 17, 2019
- Micron Technology, Inc.
- Toshiyuki Maenosono
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING A SEMICONDUCTOR DEVICE, AND A PHOTOMASK USED THEREIN
- Publication number 20220059346
- Publication date Feb 24, 2022
- Micron Technology, Inc.
- Hidenori Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING VIAS USING SILICON ON INSULATOR SUBSTRATE
- Publication number 20190371720
- Publication date Dec 5, 2019
- Micron Technology, Inc.
- Toshiyuki Maenosono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING VIAS USING SILICON ON INSULATOR SUBSTRATE
- Publication number 20180286795
- Publication date Oct 4, 2018
- Micron Technology, Inc.
- Toshiyuki Maenosono
- H01 - BASIC ELECTRIC ELEMENTS