Toshiyuki Ogata

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Filter film and use thereof
- Patent number 11,612,891
- Issue date Mar 28, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Suzuki
- G01 - MEASURING TESTING
Information Patent Grant
Gas separation method and gas separation membrane
- Patent number 11,547,968
- Issue date Jan 10, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Noguchi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Particle capture device
- Patent number 11,384,331
- Issue date Jul 12, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo Suzuki
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Substrate, structure, structure-manufacturing method, cell-sorting...
- Patent number 11,359,175
- Issue date Jun 14, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Ohsaka
- G01 - MEASURING TESTING
Information Patent Grant
Adhesive composition, adhesive film, and bonding method
- Patent number 10,793,756
- Issue date Oct 6, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Koki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas-permeable membrane
- Patent number 10,751,672
- Issue date Aug 25, 2020
- NANOMEMBRANE TECHNOLOGIES, INC.
- Shigenori Fujikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing laminate, and laminate
- Patent number 10,137,665
- Issue date Nov 27, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Noguchi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Substrate having rod-like molecules on surface thereof and method f...
- Patent number 9,149,837
- Issue date Oct 6, 2015
- National University Corporation NARA Institute of Science and Technology
- Masanobu Naito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Adhesive composition, film adhesive, and method for producing the a...
- Patent number 8,877,884
- Issue date Nov 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Motoki Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, photoresist composition containing such polymer c...
- Patent number 8,741,538
- Issue date Jun 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type photosensitive composition
- Patent number 8,426,107
- Issue date Apr 23, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Motoki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern-forming method, metal oxide film-forming material and metho...
- Patent number 8,349,543
- Issue date Jan 8, 2013
- Tokyo Ohka Kogyo Co. Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
- Patent number 8,304,163
- Issue date Nov 6, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming a nano-structure and the nano-structure
- Patent number 7,993,706
- Issue date Aug 9, 2011
- Riken
- Shigenori Fujikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
- Patent number 7,943,284
- Issue date May 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern coating material and pattern forming method
- Patent number 7,932,013
- Issue date Apr 26, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,919,227
- Issue date Apr 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, positive resist composition and resist pattern fo...
- Patent number 7,851,127
- Issue date Dec 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, resist pattern forming method and compound
- Patent number 7,851,129
- Issue date Dec 14, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer compound, photoresist composition including the polymer com...
- Patent number 7,807,328
- Issue date Oct 5, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, photoresist composition including the polymer com...
- Patent number 7,723,007
- Issue date May 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, photoresist composition containing such polymer c...
- Patent number 7,700,259
- Issue date Apr 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and resist pattern formation method by the...
- Patent number 7,700,257
- Issue date Apr 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition, and low-molecular compound and high-molecu...
- Patent number 7,592,122
- Issue date Sep 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, resist composition and dissolution inhibitor agen...
- Patent number 7,326,512
- Issue date Feb 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for liquid immersion exposure process and method...
- Patent number 7,264,918
- Issue date Sep 4, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Kotaro Endo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing monomeric ester compound for base resin in phot...
- Patent number 6,846,949
- Issue date Jan 25, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and base material carrying layer of the...
- Patent number 6,787,284
- Issue date Sep 7, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing monomeric ester compound for base resin in phot...
- Patent number 6,683,202
- Issue date Jan 27, 2004
- Tokyo Ohka, Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive laminate, process for forming resist pattern using s...
- Patent number 6,638,684
- Issue date Oct 28, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Waki Okubo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
BOLT FEEDER
- Publication number 20230347459
- Publication date Nov 2, 2023
- DENGENSHA TOA CO.,LTD.
- Yoshiaki IWAMOTO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
GAS SEPARATION METHOD AND GAS SEPARATION MEMBRANE
- Publication number 20210362091
- Publication date Nov 25, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya NOGUCHI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PARTICLE CAPTURE DEVICE
- Publication number 20200362294
- Publication date Nov 19, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SUZUKI
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
FILTER FILM AND USE THEREOF
- Publication number 20190344275
- Publication date Nov 14, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SUZUKI
- G01 - MEASURING TESTING
Information Patent Application
ADHESIVE COMPOSITION, ADHESIVE FILM, AND BONDING METHOD
- Publication number 20190023953
- Publication date Jan 24, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Koki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBRANE FILTER
- Publication number 20180304207
- Publication date Oct 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Noguchi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE, STRUCTURE, STRUCTURE-MANUFACTURING METHOD, CELL-SORTING...
- Publication number 20180282677
- Publication date Oct 4, 2018
- TOKYO OHKA KOGYO CO., LTD.
- Takashi OHSAKA
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
GAS-PERMEABLE MEMBRANE
- Publication number 20180021738
- Publication date Jan 25, 2018
- NanoMembrane Technologies, Inc.
- Shigenori FUJIKAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR MANUFACTURING LAMINATE, AND LAMINATE
- Publication number 20170203559
- Publication date Jul 20, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya NOGUCHI
- B32 - LAYERED PRODUCTS
Information Patent Application
LAMINATED FILM
- Publication number 20160279898
- Publication date Sep 29, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro SENZAKI
- B32 - LAYERED PRODUCTS
Information Patent Application
COMPOSITE LAYER MATERIAL, METHOD FOR MANUFACTURING MEMBRANE, AND ME...
- Publication number 20160152008
- Publication date Jun 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- B32 - LAYERED PRODUCTS
Information Patent Application
MEMBRANE FILTER
- Publication number 20150375176
- Publication date Dec 31, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Noguchi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ADHESIVE COMPOSITION, ADHESIVE FILM, AND BONDING METHOD
- Publication number 20150059976
- Publication date Mar 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Koki Tamura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FLUOROCARBON, METHOD FOR PREPARING FLUOROCARBON, AND USE THEREOF
- Publication number 20150010724
- Publication date Jan 8, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADHESIVE COMPOSITION FOR BONDING A WAFER AND SUPPORTING BODY FOR SA...
- Publication number 20140255638
- Publication date Sep 11, 2014
- Hirofumi Imai
- B32 - LAYERED PRODUCTS
Information Patent Application
ADHESIVE COMPOSITION, FILM ADHESIVE, AND BONDING METHOD
- Publication number 20140044962
- Publication date Feb 13, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Noguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE HAVING ROD-LIKE MOLECULES ON SURFACE THEREOF AND METHOD F...
- Publication number 20130236947
- Publication date Sep 12, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Masanobu Naito
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
- Publication number 20110091810
- Publication date Apr 21, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Adhesive composition and adhesive film
- Publication number 20110065858
- Publication date Mar 17, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Asai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION
- Publication number 20110064913
- Publication date Mar 17, 2011
- TOKYO OHKA KOGYO CO., LTD.
- Motoki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER C...
- Publication number 20100151383
- Publication date Jun 17, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100040970
- Publication date Feb 18, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yohei Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adhesive composition, film adhesive, and method for producing the a...
- Publication number 20100010182
- Publication date Jan 14, 2010
- Motoki Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHO...
- Publication number 20100003622
- Publication date Jan 7, 2010
- Tokyo Ohka Kogy Co., Ltd
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMATION OF MOLD
- Publication number 20090286936
- Publication date Nov 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Adhesive composition and adhesive film
- Publication number 20090234087
- Publication date Sep 17, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Asai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND COMPOUND
- Publication number 20090162781
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FO...
- Publication number 20090162784
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
- Publication number 20090081580
- Publication date Mar 26, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN COATING MATERIAL AND PATTERN FORMING METHOD
- Publication number 20090029284
- Publication date Jan 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Shogo Matsumaru
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Toshiyuki Ogata

Person

Patents Grantslast 30 patents

Filter film and use thereof

Gas separation method and gas separation membrane

Particle capture device

Substrate, structure, structure-manufacturing method, cell-sorting...

Adhesive composition, adhesive film, and bonding method

Gas-permeable membrane

Method for manufacturing laminate, and laminate

Substrate having rod-like molecules on surface thereof and method f...

Adhesive composition, film adhesive, and method for producing the a...

Polymer compound, photoresist composition containing such polymer c...

Positive-type photosensitive composition

Pattern-forming method, metal oxide film-forming material and metho...

Compound, dissolution inhibitor, positive type resist composition,...

Method of forming a nano-structure and the nano-structure

Compound, dissolution inhibitor, positive type resist composition,...

Pattern coating material and pattern forming method

Positive resist composition and method of forming resist pattern

Polymer compound, positive resist composition and resist pattern fo...

Resist composition, resist pattern forming method and compound

Polymer compound, photoresist composition including the polymer com...

Polymer compound, photoresist composition including the polymer com...

Polymer compound, photoresist composition containing such polymer c...

Photoresist composition and resist pattern formation method by the...

Photoresist composition, and low-molecular compound and high-molecu...

Polymer compound, resist composition and dissolution inhibitor agen...

Resist composition for liquid immersion exposure process and method...

Fluorine-containing monomeric ester compound for base resin in phot...

Positive resist composition and base material carrying layer of the...

Fluorine-containing monomeric ester compound for base resin in phot...

Photosensitive laminate, process for forming resist pattern using s...

Patents Applicationslast 30 patents

BOLT FEEDER

GAS SEPARATION METHOD AND GAS SEPARATION MEMBRANE

PARTICLE CAPTURE DEVICE

FILTER FILM AND USE THEREOF

ADHESIVE COMPOSITION, ADHESIVE FILM, AND BONDING METHOD

MEMBRANE FILTER

SUBSTRATE, STRUCTURE, STRUCTURE-MANUFACTURING METHOD, CELL-SORTING...

GAS-PERMEABLE MEMBRANE

METHOD FOR MANUFACTURING LAMINATE, AND LAMINATE

LAMINATED FILM

COMPOSITE LAYER MATERIAL, METHOD FOR MANUFACTURING MEMBRANE, AND ME...

MEMBRANE FILTER

ADHESIVE COMPOSITION, ADHESIVE FILM, AND BONDING METHOD

FLUOROCARBON, METHOD FOR PREPARING FLUOROCARBON, AND USE THEREOF

ADHESIVE COMPOSITION FOR BONDING A WAFER AND SUPPORTING BODY FOR SA...

ADHESIVE COMPOSITION, FILM ADHESIVE, AND BONDING METHOD

SUBSTRATE HAVING ROD-LIKE MOLECULES ON SURFACE THEREOF AND METHOD F...

COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...

Adhesive composition and adhesive film

POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION

POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER C...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Adhesive composition, film adhesive, and method for producing the a...

PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHO...

COMPOSITION FOR FORMATION OF MOLD

Adhesive composition and adhesive film

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND COMPOUND

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FO...

COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...

PATTERN COATING MATERIAL AND PATTERN FORMING METHOD