Toshiyuki Oie

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Aqueous composition and cleaning method using same
- Patent number 11,629,315
- Issue date Apr 18, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Aqueous composition and cleaning method using same
- Patent number 11,613,720
- Issue date Mar 28, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Composition having suppressed alumina damage and production method...
- Patent number 11,479,744
- Issue date Oct 25, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Aqueous composition and cleaning method using same
- Patent number 11,352,593
- Issue date Jun 7, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Akinobu Horita
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Liquid composition for reducing damage of cobalt, alumina, interlay...
- Patent number 11,193,094
- Issue date Dec 7, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Wet etching composition for substrate having SiN layer and Si layer...
- Patent number 10,689,573
- Issue date Jun 23, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Akinobu Horita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor element cleaning solution that suppresses damage to t...
- Patent number 10,651,028
- Issue date May 12, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor element cleaning solution that suppresses damage to c...
- Patent number 10,629,426
- Issue date Apr 21, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution and cleaning method for material comprising carbo...
- Patent number 10,538,718
- Issue date Jan 21, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alkaline earth metal-containing cleaning solution for cleaning semi...
- Patent number 10,377,978
- Issue date Aug 13, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Semiconductor element cleaning solution that suppresses damage to t...
- Patent number 10,160,938
- Issue date Dec 25, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor element cleaning liquid and cleaning method
- Patent number 10,035,978
- Issue date Jul 31, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki Oie
- B08 - CLEANING
Information Patent Grant
Cleaning liquid for semiconductor elements and cleaning method usin...
- Patent number 9,422,512
- Issue date Aug 23, 2016
- Mitsubishi Gas Chemical Company, Inc.
- Kenji Shimada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME
- Publication number 20210155881
- Publication date May 27, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Akinobu HORITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME
- Publication number 20210147768
- Publication date May 20, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
LIQUID COMPOSITION FOR REDUCING DAMAGE OF COBALT, ALUMINA, INTERLAY...
- Publication number 20210087501
- Publication date Mar 25, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME
- Publication number 20210047593
- Publication date Feb 18, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE FLUID FOR ALUMINA, PROTECTION METHOD, AND PRODUCTION MET...
- Publication number 20210002551
- Publication date Jan 7, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C01 - INORGANIC CHEMISTRY
Information Patent Application
COMPOSITION HAVING SUPPRESSED ALUMINA DAMAGE AND PRODUCTION METHOD...
- Publication number 20210002591
- Publication date Jan 7, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
WET ETCHING COMPOSITION FOR SUBSTRATE HAVING SiN LAYER AND Si LAYER...
- Publication number 20190040317
- Publication date Feb 7, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Akinobu HORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING SOLUTION AND CLEANING METHOD FOR MATERIAL COMPRISING CARBO...
- Publication number 20180087006
- Publication date Mar 29, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
ALKALINE EARTH METAL-CONTAINING CLEANING SOLUTION FOR CLEANING SEMI...
- Publication number 20170335248
- Publication date Nov 23, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO T...
- Publication number 20170278701
- Publication date Sep 28, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO C...
- Publication number 20170240850
- Publication date Aug 24, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO T...
- Publication number 20170233687
- Publication date Aug 17, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SEMICONDUCTOR ELEMENT CLEANING LIQUID AND CLEANING METHOD
- Publication number 20170015955
- Publication date Jan 19, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Toshiyuki OIE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USIN...
- Publication number 20150210966
- Publication date Jul 30, 2015
- MITSUBISHI GAS CHEMICAL COMPANY, INC
- Kenji Shimada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Toshiyuki Oie

Person

Patents Grantslast 30 patents

Aqueous composition and cleaning method using same

Aqueous composition and cleaning method using same

Composition having suppressed alumina damage and production method...

Aqueous composition and cleaning method using same

Liquid composition for reducing damage of cobalt, alumina, interlay...

Wet etching composition for substrate having SiN layer and Si layer...

Semiconductor element cleaning solution that suppresses damage to t...

Semiconductor element cleaning solution that suppresses damage to c...

Cleaning solution and cleaning method for material comprising carbo...

Alkaline earth metal-containing cleaning solution for cleaning semi...

Semiconductor element cleaning solution that suppresses damage to t...

Semiconductor element cleaning liquid and cleaning method

Cleaning liquid for semiconductor elements and cleaning method usin...

Patents Applicationslast 30 patents

AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME

AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME

LIQUID COMPOSITION FOR REDUCING DAMAGE OF COBALT, ALUMINA, INTERLAY...

AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME

PROTECTIVE FLUID FOR ALUMINA, PROTECTION METHOD, AND PRODUCTION MET...

COMPOSITION HAVING SUPPRESSED ALUMINA DAMAGE AND PRODUCTION METHOD...

WET ETCHING COMPOSITION FOR SUBSTRATE HAVING SiN LAYER AND Si LAYER...

CLEANING SOLUTION AND CLEANING METHOD FOR MATERIAL COMPRISING CARBO...

ALKALINE EARTH METAL-CONTAINING CLEANING SOLUTION FOR CLEANING SEMI...

SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO T...

SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO C...

SEMICONDUCTOR ELEMENT CLEANING SOLUTION THAT SUPPRESSES DAMAGE TO T...

SEMICONDUCTOR ELEMENT CLEANING LIQUID AND CLEANING METHOD

CLEANING LIQUID FOR SEMICONDUCTOR ELEMENTS AND CLEANING METHOD USIN...