Toshiyuki Uno

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,124,164
- Issue date Oct 22, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 12,038,685
- Issue date Jul 16, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,982,935
- Issue date May 14, 2024
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
- Patent number 11,953,822
- Issue date Apr 9, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,914,283
- Issue date Feb 27, 2024
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, mask blank for EUV litho...
- Patent number 11,822,229
- Issue date Nov 21, 2023
- AGC Inc.
- Daijiro Akagi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,698,580
- Issue date Jul 11, 2023
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,036,127
- Issue date Jun 15, 2021
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective element for mask blank and process for producing reflect...
- Patent number 10,254,640
- Issue date Apr 9, 2019
- AGC Inc.
- Toshiyuki Uno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 9,097,976
- Issue date Aug 4, 2015
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with conductive film, substrate with multilayer reflectiv...
- Patent number 9,086,629
- Issue date Jul 21, 2015
- Asahi Glass Company, Limited
- Kazunobu Maeshige
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography and process for producing...
- Patent number 8,956,787
- Issue date Feb 17, 2015
- Asahi Glass Company, Limited
- Toshiyuki Uno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 8,288,062
- Issue date Oct 16, 2012
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography and mask for EUV lithography
- Patent number 8,168,352
- Issue date May 1, 2012
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 8,029,950
- Issue date Oct 4, 2011
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Black matrix for liquid crystal display devices and color filter
- Patent number 6,383,695
- Issue date May 7, 2002
- Asahi Glass Company, Limited
- Toshiyuki Uno
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240241433
- Publication date Jul 18, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20240210814
- Publication date Jun 27, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20240201576
- Publication date Jun 20, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240176225
- Publication date May 30, 2024
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240152044
- Publication date May 9, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...
- Publication number 20240045319
- Publication date Feb 8, 2024
- AGC Inc.
- Daijiro AKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20230324785
- Publication date Oct 12, 2023
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20230305383
- Publication date Sep 28, 2023
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION-TYPE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTION-TYPE MAS...
- Publication number 20230288794
- Publication date Sep 14, 2023
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20220299862
- Publication date Sep 22, 2022
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20220236636
- Publication date Jul 28, 2022
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20220075256
- Publication date Mar 10, 2022
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...
- Publication number 20220035234
- Publication date Feb 3, 2022
- AGC Inc.
- Daijiro AKAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20210325772
- Publication date Oct 21, 2021
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20190056653
- Publication date Feb 21, 2019
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE ELEMENT FOR MASK BLANK AND PROCESS FOR PRODUCING REFLECT...
- Publication number 20170235218
- Publication date Aug 17, 2017
- Asahi Glass Company, Limited
- Toshiyuki UNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...
- Publication number 20130323630
- Publication date Dec 5, 2013
- Asahi Glass Company, Limited
- Kazunobu Maeshige
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20130316272
- Publication date Nov 28, 2013
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING...
- Publication number 20120322000
- Publication date Dec 20, 2012
- ASAHI GLASS COMPANY, LIMITED
- Toshiyuki Uno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20120107733
- Publication date May 3, 2012
- ASAHI GLASS COMPANY, LIMITED
- Kazuyuki HAYASHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND MASK FOR EUV LITHOGRAPHY
- Publication number 20110104595
- Publication date May 5, 2011
- Asahi Glass Company, Limited
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20100304283
- Publication date Dec 2, 2010
- ASAHI GLASS COMPANY, LIMITED
- Kazuyuki Hayashi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion beam sputtering apparatus and film deposition method for a mult...
- Publication number 20070087578
- Publication date Apr 19, 2007
- ASAHI GLASS COMPANY LIMITED
- Takashi Sugiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Black matrix for liquid crystal display devices and color filter
- Publication number 20020034698
- Publication date Mar 21, 2002
- Asahi Glass Company, Limited
- Toshiyuki Uno
- G02 - OPTICS

Toshiyuki Uno

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography, reflective mask for EUV...

Reflective mask blank and reflective mask

Reflective mask blank for EUV lithography, mask blank for EUV litho...

Reflective mask blank for EUV lithography

Reflective mask blank and reflective mask

Reflective element for mask blank and process for producing reflect...

Reflective mask blank for EUV lithography

Substrate with conductive film, substrate with multilayer reflectiv...

Reflective mask blank for EUV lithography and process for producing...

Reflective mask blank for EUV lithography

Reflective mask blank for EUV lithography and mask for EUV lithography

Reflective mask blank for EUV lithography

Black matrix for liquid crystal display devices and color filter

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTION-TYPE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTION-TYPE MAS...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, MASK BLANK FOR EUV LITHO...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE ELEMENT FOR MASK BLANK AND PROCESS FOR PRODUCING REFLECT...

SUBSTRATE WITH CONDUCTIVE FILM, SUBSTRATE WITH MULTILAYER REFLECTIV...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND MASK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

Ion beam sputtering apparatus and film deposition method for a mult...

Black matrix for liquid crystal display devices and color filter