Toshiyuki Uno

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Guilderland, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Reflective-type mask blank for EUV lithography
- Patent number 7,960,077
- Issue date Jun 14, 2011
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for smoothing a surface of a glass substrate for a reflectiv...
- Patent number 7,712,333
- Issue date May 11, 2010
- Asahi Glass Company, Limited
- Toshiyuki Uno
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Reflective-type mask blank for EUV lithography
- Patent number 7,678,511
- Issue date Mar 16, 2010
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Defect repair device and defect repair method
- Patent number 7,230,695
- Issue date Jun 12, 2007
- Asahi Glass Company, Ltd.
- Yoshiaki Ikuta
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE-TYPE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20100167187
- Publication date Jul 1, 2010
- ASAHI GLASS COMPANY, LIMITED
- Yoshiaki Ikuta
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for smoothing a surface of a glass substrate, and substrate...
- Publication number 20070240453
- Publication date Oct 18, 2007
- ASAHI GLASS COMPANY LIMITED
- Toshiyuki Uno
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflective-type mask blank for EUV lithography
- Publication number 20070160916
- Publication date Jul 12, 2007
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B82 - NANO-TECHNOLOGY
Information Patent Application
Defect repair device and defect repair method
- Publication number 20060007433
- Publication date Jan 12, 2006
- Asahi Glass Company Ltd.
- Yoshiaki Ikuta
- B82 - NANO-TECHNOLOGY