Tosihiko Netsuko

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photomask material and method of processing thereof
- Patent number 6,312,857
- Issue date Nov 6, 2001
- Mitsubishi Paper Mills Ltd.
- Kunihiro Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY