TRAVIS KOH

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma enhanced CVD with periodic high voltage bias
- Patent number 12,094,707
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,728,124
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 11,069,504
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for tunable workpiece biasing in a plasma reactor
- Patent number 10,923,320
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Travis Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with electrically floating power supply
- Patent number 10,904,996
- Issue date Jan 26, 2021
- Applied Materials, Inc.
- Travis Lee Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced CVD with periodic high voltage bias
- Patent number 10,840,086
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for coupling a voltage to portions of a substrate
- Patent number 10,714,372
- Issue date Jul 14, 2020
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 10,685,807
- Issue date Jun 16, 2020
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for tunable workpiece biasing in a plasma reactor
- Patent number 10,373,804
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Travis Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating ion energy distribution functions (IEDF)
- Patent number 10,312,048
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet configurations for radial uniformity tuning of ICP plasmas
- Patent number 10,249,479
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Joseph F. Aubuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a magnetic field in a plasma c...
- Patent number 10,115,566
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Steven Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for selective coil excitation in inductively coup...
- Patent number 9,659,751
- Issue date May 23, 2017
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a magnetic field in a plasma c...
- Patent number 9,613,783
- Issue date Apr 4, 2017
- Applied Materials, Inc.
- Steven Lane
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Creating Ion Energy Distribution Functions (IEDF)
- Publication number 20230352264
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20210343496
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20210134561
- Publication date May 6, 2021
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED CVD WITH PERIODIC HIGH VOLTAGE BIAS
- Publication number 20210028012
- Publication date Jan 28, 2021
- Kelvin Chan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA EMISSION MONITORING SYSTEM WITH CROSS-DISPERSION GRATING
- Publication number 20200340858
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Philip Allan Kraus
- G02 - OPTICS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20200266022
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20190348258
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED CVD WITH PERIODIC HIGH VOLTAGE BIAS
- Publication number 20190333764
- Publication date Oct 31, 2019
- Applied Materials, Inc.
- Kelvin CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20190259562
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH ELECTRICALLY FLOATING POWER SUPPLY
- Publication number 20190090338
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Travis Lee KOH
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
SYSTEM FOR COUPLING A VOLTAGE TO PORTIONS OF A SUBSTRATE
- Publication number 20190088521
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Thai Cheng CHUA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE SUPPORT WITH COOLED AND CONDUCTING PINS
- Publication number 20190088518
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Travis Lee KOH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR
- Publication number 20180226225
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- TRAVIS KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)
- Publication number 20180166249
- Publication date Jun 14, 2018
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRA...
- Publication number 20170358431
- Publication date Dec 14, 2017
- LEONID DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA C...
- Publication number 20170162365
- Publication date Jun 8, 2017
- Applied Materials, Inc.
- STEVEN LANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNET CONFIGURATIONS FOR RADIAL UNIFORMITY TUNING OF ICP PLASMAS
- Publication number 20160225590
- Publication date Aug 4, 2016
- Applied Materials, Inc.
- Joseph F. Aubuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR SELECTIVE COIL EXCITATION IN INDUCTIVELY COUP...
- Publication number 20160027616
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- KARTIK RAMASWAMY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA C...
- Publication number 20160027613
- Publication date Jan 28, 2016
- Applied Materials, Inc.
- STEVEN LANE
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma enhanced CVD with periodic high voltage bias

Creating ion energy distribution functions (IEDF)

Creating ion energy distribution functions (IEDF)

System for tunable workpiece biasing in a plasma reactor

Substrate support with electrically floating power supply

Plasma enhanced CVD with periodic high voltage bias

System for coupling a voltage to portions of a substrate

Creating ion energy distribution functions (IEDF)

System for tunable workpiece biasing in a plasma reactor

Creating ion energy distribution functions (IEDF)

Magnet configurations for radial uniformity tuning of ICP plasmas

Method and apparatus for controlling a magnetic field in a plasma c...

System and method for selective coil excitation in inductively coup...

Method and apparatus for controlling a magnetic field in a plasma c...

Patents Applicationslast 30 patents

Creating Ion Energy Distribution Functions (IEDF)

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

PLASMA ENHANCED CVD WITH PERIODIC HIGH VOLTAGE BIAS

PLASMA EMISSION MONITORING SYSTEM WITH CROSS-DISPERSION GRATING

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

PLASMA ENHANCED CVD WITH PERIODIC HIGH VOLTAGE BIAS

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

SUBSTRATE SUPPORT WITH ELECTRICALLY FLOATING POWER SUPPLY

SYSTEM FOR COUPLING A VOLTAGE TO PORTIONS OF A SUBSTRATE

SUBSTRATE SUPPORT WITH COOLED AND CONDUCTING PINS

SYSTEM FOR TUNABLE WORKPIECE BIASING IN A PLASMA REACTOR

CREATING ION ENERGY DISTRIBUTION FUNCTIONS (IEDF)

SYSTEMS AND METHODS FOR CONTROLLING A VOLTAGE WAVEFORM AT A SUBSTRA...

METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA C...

MAGNET CONFIGURATIONS FOR RADIAL UNIFORMITY TUNING OF ICP PLASMAS

SYSTEM AND METHOD FOR SELECTIVE COIL EXCITATION IN INDUCTIVELY COUP...

METHOD AND APPARATUS FOR CONTROLLING A MAGNETIC FIELD IN A PLASMA C...