Tsan-Chun Wang

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Gate structure of semiconductor device and method of manufacture
- Patent number 12,211,701
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of fin-type field effect transistor structure
- Patent number 12,211,843
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial layer for semiconductor process
- Patent number 12,205,994
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial layer for semiconductor process
- Patent number 11,848,361
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 11,728,219
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,677,012
- Issue date Jun 13, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making multi-gate transistors and resulting structures
- Patent number 11,532,485
- Issue date Dec 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of semiconductor device and method of manufacture
- Patent number 11,361,977
- Issue date Jun 14, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fin-type field effect transistor structure and manufacturing method...
- Patent number 11,289,479
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial layer for semiconductor process
- Patent number 11,257,911
- Issue date Feb 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of semiconductor device structure by implantation
- Patent number 11,127,817
- Issue date Sep 21, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,043,580
- Issue date Jun 22, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 11,031,293
- Issue date Jun 8, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 11,011,428
- Issue date May 18, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making multi-gate transistors and resulting structures
- Patent number 10,854,471
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to reduce etch variation using ion implantation
- Patent number 10,854,729
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation methods and structures thereof
- Patent number 10,847,431
- Issue date Nov 24, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming semiconductor structure
- Patent number 10,832,913
- Issue date Nov 10, 2020
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of semiconductor device
- Patent number 10,741,412
- Issue date Aug 11, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,714,598
- Issue date Jul 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin-type field effect transistor structure and manufacturing method...
- Patent number 10,629,596
- Issue date Apr 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Minimization of plasma doping induced fin height loss
- Patent number 10,566,242
- Issue date Feb 18, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ling Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlayer dielectric film in semiconductor devices
- Patent number 10,535,557
- Issue date Jan 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to reduce etch variation using ion implantation
- Patent number 10,490,648
- Issue date Nov 26, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 10,490,452
- Issue date Nov 26, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making multi-gate transistors and resulting structures
- Patent number 10,361,094
- Issue date Jul 23, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flowable CVD quality control in STI loop
- Patent number 10,269,656
- Issue date Apr 23, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlayer dielectric film in semiconductor devices
- Patent number 10,249,530
- Issue date Apr 2, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for making multi-gate transistors and resulting structures
- Patent number 10,177,006
- Issue date Jan 8, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 10,163,657
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Sacrificial Layer for Semiconductor Process
- Publication number 20240072128
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20220310405
- Publication date Sep 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE
- Publication number 20220216202
- Publication date Jul 7, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SACRIFICIAL LAYER FOR SEMICONDUCTOR PROCESS
- Publication number 20220181451
- Publication date Jun 9, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sacrificial Layer for Semiconductor Process
- Publication number 20210313435
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20210313456
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20210272850
- Publication date Sep 2, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Making Multi-Gate Transistors and Resulting Structures
- Publication number 20210111035
- Publication date Apr 15, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20200365414
- Publication date Nov 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD...
- Publication number 20200279846
- Publication date Sep 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20200203507
- Publication date Jun 25, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20200051865
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20200051864
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SEMICONDUCTOR DEVICE STRUCTURE BY IMPLANTATION
- Publication number 20200020772
- Publication date Jan 16, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO REDUCE ETCH VARIATION USING ION IMPLANTATION
- Publication number 20200020784
- Publication date Jan 16, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Making Multi-Gate Transistors and Resulting Structures
- Publication number 20190348298
- Publication date Nov 14, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SEMICONDUCTOR STRUCTURE
- Publication number 20190252192
- Publication date Aug 15, 2019
- Taiwan Semiconductor Manufacturing company Ltd.
- TSAN-CHUN WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interlayer Dielectric Film in Semiconductor Devices
- Publication number 20190229012
- Publication date Jul 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method of Manufacture
- Publication number 20190088498
- Publication date Mar 21, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20190006242
- Publication date Jan 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20190006492
- Publication date Jan 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Making Multi-Gate Transistors and Resulting Structures
- Publication number 20180366341
- Publication date Dec 20, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD...
- Publication number 20180301453
- Publication date Oct 18, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INNOVATIVE APPROACH TO MINIMIZE PLASMA DOPING INDUCED FIN HEIGHT LOSS
- Publication number 20180166341
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ling CHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for Making Multi-Gate Transistors and Resulting Structures
- Publication number 20180151387
- Publication date May 31, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Su-Hao Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION METHODS AND STRUCTURES THEREOF
- Publication number 20180130715
- Publication date May 10, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flowable CVD Quality Control in STI Loop
- Publication number 20180061717
- Publication date Mar 1, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsan-Chun Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR
- Publication number 20170278743
- Publication date Sep 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD...
- Publication number 20170256539
- Publication date Sep 7, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interlayer Dielectric Film in Semiconductor Devices
- Publication number 20170207117
- Publication date Jul 20, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsan-Chun WANG
- H01 - BASIC ELECTRIC ELEMENTS

Tsan-Chun Wang

Person

Patents Grantslast 30 patents

Gate structure of semiconductor device and method of manufacture

Manufacturing method of fin-type field effect transistor structure

Sacrificial layer for semiconductor process

Sacrificial layer for semiconductor process

Method for fabricating a semiconductor device

Method of manufacturing semiconductor devices

Process for making multi-gate transistors and resulting structures

Gate structure of semiconductor device and method of manufacture

Fin-type field effect transistor structure and manufacturing method...

Sacrificial layer for semiconductor process

Formation of semiconductor device structure by implantation

Method of manufacturing semiconductor devices

Method for fabricating a semiconductor device

Method for fabricating a semiconductor device

Process for making multi-gate transistors and resulting structures

Method to reduce etch variation using ion implantation

Ion implantation methods and structures thereof

Method and apparatus for forming semiconductor structure

Gate structure of semiconductor device

Method of manufacturing semiconductor device

Fin-type field effect transistor structure and manufacturing method...

Minimization of plasma doping induced fin height loss

Interlayer dielectric film in semiconductor devices

Method to reduce etch variation using ion implantation

Method for fabricating a semiconductor device

Process for making multi-gate transistors and resulting structures

Flowable CVD quality control in STI loop

Interlayer dielectric film in semiconductor devices

Process for making multi-gate transistors and resulting structures

Semiconductor device and method of manufacture

Patents Applicationslast 30 patents

Sacrificial Layer for Semiconductor Process

GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

MANUFACTURING METHOD OF FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE

SACRIFICIAL LAYER FOR SEMICONDUCTOR PROCESS

Sacrificial Layer for Semiconductor Process

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

Process for Making Multi-Gate Transistors and Resulting Structures

GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

FORMATION OF SEMICONDUCTOR DEVICE STRUCTURE BY IMPLANTATION

METHOD TO REDUCE ETCH VARIATION USING ION IMPLANTATION

Process for Making Multi-Gate Transistors and Resulting Structures

METHOD AND APPARATUS FOR FORMING SEMICONDUCTOR STRUCTURE

Interlayer Dielectric Film in Semiconductor Devices

Semiconductor Device and Method of Manufacture

METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Process for Making Multi-Gate Transistors and Resulting Structures

FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD...

INNOVATIVE APPROACH TO MINIMIZE PLASMA DOPING INDUCED FIN HEIGHT LOSS

Process for Making Multi-Gate Transistors and Resulting Structures

ION IMPLANTATION METHODS AND STRUCTURES THEREOF

Flowable CVD Quality Control in STI Loop

SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR

FIN-TYPE FIELD EFFECT TRANSISTOR STRUCTURE AND MANUFACTURING METHOD...

Interlayer Dielectric Film in Semiconductor Devices