Tse-Liang Ying

Person

Hsin-Chu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
High efficiency thin film inductor
- Patent number 6,433,665
- Issue date Aug 13, 2002
- Taiwan Semiconductor Manufacturing Company
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High efficiency thin film inductor
- Patent number 6,373,369
- Issue date Apr 16, 2002
- Taiwan Semiconductor Manufacturing Company
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned etching method for forming high areal density patterne...
- Patent number 6,306,767
- Issue date Oct 23, 2001
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Chyuan Tzeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a fuse structure for improved repaired yields on...
- Patent number 6,307,213
- Issue date Oct 23, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a shallow trench isolation which is not susc...
- Patent number 6,287,939
- Issue date Sep 11, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High efficiency thin film inductor
- Patent number 6,278,352
- Issue date Aug 21, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a self aligned contact which eliminates the...
- Patent number 6,214,715
- Issue date Apr 10, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Common gate and salicide word line process for low cost embedded DR...
- Patent number 6,207,492
- Issue date Mar 27, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo-Chyuan Tzeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to evaluate hemisperical grain (HSG) polysilicon surface
- Patent number 6,194,234
- Issue date Feb 27, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Node process integration technology to improve data retention for l...
- Patent number 6,187,659
- Issue date Feb 13, 2001
- Taiwan Semiconductor Manufacturing Company
- Tse-Liang Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a self aligned contact which eliminates the...
- Patent number 6,174,802
- Issue date Jan 16, 2001
- Taiwan Semiconductor Manufacturing Company
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of the aspect ratio of deep contact holes for embedded DR...
- Patent number 6,168,984
- Issue date Jan 2, 2001
- Taiwan Semiconductor Manufacturing Company
- Chue-San Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a fuse in integrated circuit application
- Patent number 6,162,686
- Issue date Dec 19, 2000
- Taiwan Semiconductor Manufacturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a fuse structure for improved repaired yields on...
- Patent number 6,121,073
- Issue date Sep 19, 2000
- Taiwan Semiconductor Manufacturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to form trench-free buried contact in process with STI techn...
- Patent number 6,093,619
- Issue date Jul 25, 2000
- Taiwan Semiconductor Manufaturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation technology to eliminate a kink effect
- Patent number 6,080,637
- Issue date Jun 27, 2000
- Taiwan Semiconductor Manufacturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a dual-gate dielectric module for memory emb...
- Patent number 6,037,222
- Issue date Mar 14, 2000
- Taiwan Semiconductor Manufacturing Company
- Kuo Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preventing polycide line deformation by polycide hardening
- Patent number 5,946,596
- Issue date Aug 31, 1999
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tse-Liang Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Approaches to integrate the deep contact module
- Patent number 5,922,515
- Issue date Jul 13, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chuan Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making low-topography buried capacitor by a two stage et...
- Patent number 5,885,865
- Issue date Mar 23, 1999
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Mong-Song Liang
- E04 - BUILDING
Information Patent Grant
Formation of a stacked cylindrical capacitor module in the DRAM tec...
- Patent number 5,811,331
- Issue date Sep 22, 1998
- Taiwan Semiconductor Manufacturing Company Ltd.
- Tse-Liang Ying
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a cylindrical polysilicon module in dram technology
- Patent number 5,753,547
- Issue date May 19, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tse-Liang Ying
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
High efficiency thin film inductor
- Publication number 20010013820
- Publication date Aug 16, 2001
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High efficiency thin film inductor
- Publication number 20010013821
- Publication date Aug 16, 2001
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Kuo-Ching Huang
- H01 - BASIC ELECTRIC ELEMENTS

Tse-Liang Ying

Person

Patents Grantslast 30 patents

High efficiency thin film inductor

High efficiency thin film inductor

Self-aligned etching method for forming high areal density patterne...

Method for making a fuse structure for improved repaired yields on...

Method for fabricating a shallow trench isolation which is not susc...

High efficiency thin film inductor

Method for fabricating a self aligned contact which eliminates the...

Common gate and salicide word line process for low cost embedded DR...

Method to evaluate hemisperical grain (HSG) polysilicon surface

Node process integration technology to improve data retention for l...

Method for fabricating a self aligned contact which eliminates the...

Reduction of the aspect ratio of deep contact holes for embedded DR...

Method for forming a fuse in integrated circuit application

Method for making a fuse structure for improved repaired yields on...

Method to form trench-free buried contact in process with STI techn...

Shallow trench isolation technology to eliminate a kink effect

Method for fabricating a dual-gate dielectric module for memory emb...

Method for preventing polycide line deformation by polycide hardening

Approaches to integrate the deep contact module

Method for making low-topography buried capacitor by a two stage et...

Formation of a stacked cylindrical capacitor module in the DRAM tec...

Formation of a cylindrical polysilicon module in dram technology

Patents Applicationslast 30 patents

High efficiency thin film inductor

High efficiency thin film inductor