Tseng-Chung Lee

Person

New York, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Damascene capacitors for integrated circuits
- Patent number 6,750,495
- Issue date Jun 15, 2004
- Agere Systems Inc.
- Glenn B. Alers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch endpoint detection
- Patent number 6,228,277
- Issue date May 8, 2001
- Lucent Technologies Inc.
- Avinoam Kornblit
- G01 - MEASURING TESTING
Information Patent Grant
Dynamic data visualization
- Patent number 6,021,215
- Issue date Feb 1, 2000
- Lucent Technologies, Inc.
- Avinoam Kornblit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma etch end point detection process
- Patent number 5,877,407
- Issue date Mar 2, 1999
- Lucent Technologies Inc.
- Gardy Cadet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Process for fabricating a device using polarized light to determine...
- Patent number 5,835,221
- Issue date Nov 10, 1998
- Lucent Technologies Inc.
- Tseng-Chung Lee
- G01 - MEASURING TESTING
Information Patent Grant
Measurement and control of linewidths in periodic structures using...
- Patent number 5,739,909
- Issue date Apr 14, 1998
- Lucent Technologies Inc.
- Nadine Blayo
- G01 - MEASURING TESTING
Information Patent Grant
Active neural network determination of endpoint in a plasma etch pr...
- Patent number 5,653,894
- Issue date Aug 5, 1997
- Lucent Technologies Inc.
- Dale Edward Ibbotson
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method and apparatus for real time monitoring of wafer attributes i...
- Patent number 5,654,903
- Issue date Aug 5, 1997
- Lucent Technologies Inc.
- Edward A. Reitman
- G05 - CONTROLLING REGULATING
Information Patent Grant
Process for fabricating a device using an ellipsometric technique
- Patent number 5,494,697
- Issue date Feb 27, 1996
- AT&T Corp.
- Nadine Blayo
- G01 - MEASURING TESTING

Tseng-Chung Lee

Person

Patents Grantslast 30 patents

Damascene capacitors for integrated circuits

Etch endpoint detection

Dynamic data visualization

Plasma etch end point detection process

Process for fabricating a device using polarized light to determine...

Measurement and control of linewidths in periodic structures using...

Active neural network determination of endpoint in a plasma etch pr...

Method and apparatus for real time monitoring of wafer attributes i...

Process for fabricating a device using an ellipsometric technique